申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20220146935A1
公开(公告)日:2022-05-12
Provided are a carboxylate capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. Disclosed are a carboxylate represented by formula (I) and a resist composition:
wherein Ar represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, X
1
represents an oxygen atom or a sulfur atom, R
1
represents a halogen atom or a haloalkyl group having 1 to 12 carbon atoms, R
2
represents a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH
2
— included in the haloalkyl group and the alkyl group may be replaced by —O— or —CO—, m1 represents an integer of 1 to 6, m2 represents an integer of 0 to 4, and Z
+
represents an organic cation.