申请人:E. R. Squibb & Sons, Inc.
公开号:US04179561A1
公开(公告)日:1979-12-18
Compounds are provided having the structure ##STR1## wherein R.sup.1 and R.sup.2 may be the same or different and R.sup.1 is hydrogen, alkyl of 1-3 carbons, phenyl optionally substituted by R.sup.4 or ##STR2## R.sup.2 is ##STR3## hydrogen, lower alkyl or phenyl optionally substituted by R.sup.4 with the proviso that at least one of R.sup.1 and R.sup.2 is ##STR4## R.sup.3 is hydrogen, lower alkyl, benzyl or phenyl optionally substituted by R.sup.4 ; and R.sup.4 and R.sup.5 are the same or different and represent hydrogen, lower alkyl, lower alkoxy, alkanoyloxy, benzyloxy, benzyloxy having a single mono-lower alkoxy substituent, hydroxy, halogen (Cl, Br and F), nitro, and trifluoromethyl; R.sup.6 is hydrogen, lower alkyl, alkanoyl, aroyl, aralkanoyl, aralkyl or phenyl; and R.sup.7, R.sup.8, m and n are as defined hereinafter.
提供具有以下结构的化合物##STR1##
其中R.sup.1和R.sup.2可以相同也可以不同,R.sup.1是氢,1-3个碳的烷基,苯基可选地被R.sup.4或##STR2##取代,R.sup.2是##STR3##氢,较低的烷基或苯基,可选地由R.sup.4取代,但至少有一个R.sup.1和R.sup.2是##STR4##
R.sup.3是氢,较低的烷基,苄基或苯基,可选地由R.sup.4取代; R.sup.4和R.sup.5相同或不同,表示氢,较低的烷基,较低的烷氧基,烷酰氧基,苄氧基,带有单个单烷氧基取代物的苄氧基,羟基,卤素(Cl,Br和F),硝基和三氟甲基; R.sup.6是氢,较低的烷基,烷酰基,芳香酰基,芳基烷酰基,芳基烷基或苯基; R.sup.7,R.sup.8,m和n的定义如下。