GERMANIUM- AND ZIRCONIUM-CONTAINING COMPOSITIONS FOR VAPOR DEPOSITION OF ZIRCONIUM-CONTAINING FILMS
申请人:L'Air Liquide, Société Anonyme pour l'Etude et l' Exploitation des Procédés Georges Claude
公开号:US20150110958A1
公开(公告)日:2015-04-23
Disclosed are Germanium- and Zirconium-containing precursors having one of the following formulae:
wherein each R
1
, R
2
, R
3
, R
4
, R
5
, R
6
, R
7
, R
8
, R
9
and R
10
is independently selected from H; a C1-C5 linear, branched, or cyclic alkyl group; and a C1-C5 linear, branched, or cyclic fluoroalkyl groups. Also disclosed are methods of synthesizing the disclosed precursors and using the same to deposit Zirconium-containing films on substrates via vapor deposition processes.
本发明涉及具有以下公式之一的含锗和含锆前体:
其中,每个R1、R2、R3、R4、R5、R6、R7、R8、R9和R10独立地选自H;C1-C5线性、支链或环烷基;以及C1-C5线性、支链或环氟烷基。本发明还涉及合成所述前体的方法,并使用它们通过蒸发沉积过程在基板上沉积含锆薄膜。