2H-全氟-5,8,11,14-四甲基-3,6,9,12,15-五氧杂十八烷 | 37486-69-4

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 中文名称: 2H-全氟-5,8,11,14-四甲基-3,6,9,12,15-五氧杂十八烷
• 中文别名: 2H-全氟-5,8,11,14-四甲基-3,6,9,12,15-五噁十八烷
• 英文名称: 1,1,1,2,3,3-Hexafluoro-2-(1,1,2,3,3,3-hexafluoro-2-heptafluoropropyloxy-propoxy)-3-{1,2,2-trifluoro-1-trifluoromethyl-2-[1,2,2-trifluoro-2-(1,2,2,2-tetrafluoro-ethoxy)-1-trifluoromethyl-ethoxy]-ethoxy}-propane
• 英文别名: 2H-Tricosafluoro-5,8,11,14-tetrakis(trifluoromethyl)-3,6,9,12,15-pentaoxaoctadecane；1,1,1,2,3,3-hexafluoro-2-[1,1,2,3,3,3-hexafluoro-2-[1,1,2,3,3,3-hexafluoro-2-[1,1,2,3,3,3-hexafluoro-2-(1,1,2,2,3,3,3-heptafluoropropoxy)propoxy]propoxy]propoxy]-3-(1,2,2,2-tetrafluoroethoxy)propane
• CAS: 37486-69-4
• 化学式: C₁₇HF₃₅O₅
• 分子量: 950.136
• InChiKey: MEXQRXXROOSHGK-UHFFFAOYSA-N

物化性质

• 熔点：
  -95°C
• 沸点：
  221-225°C
• 密度：
  1,765 g/cm3
• 闪点：
  221-225°C
• LogP：
  2.6-3.2 at 25℃
• 稳定性/保质期：
  常规情况下不会分解，也没有危险反应。

计算性质

• 辛醇/水分配系数(LogP)：
  12.5
• 重原子数：
  57
• 可旋转键数：
  15
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  46.2
• 氢给体数：
  0
• 氢受体数：
  40

安全信息

• TSCA：
  Yes
• 危险品标志：
  Xi

文献信息

• Novel polymers, resist compositions and patterning process
  申请人：——

  公开号：US20010033989A1

  公开（公告）日：2001-10-25

  Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F 2 excimer laser light are obtained.

  具有氟酯基团的聚合物是新型的。使用这些聚合物，可以获得具有低吸收F2准分子激光光的抗蚀剂组成物。
• Polymer, chemically amplified resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020004569A1

  公开（公告）日：2002-01-10

  Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F 2 excimer laser light are obtained.

  由含有氟化烷基的环氧烷重复单元组成的高分子是新颖的，并且具有透明度和碱溶性。使用这些高分子，可以获得低吸收F2准分子激光光的抗蚀剂组成物。
• Fluorine-containing polymers, resist compositions and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1126322A2

  公开（公告）日：2001-08-22

  Polymers having fluorinated ester groups are novel. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.

  具有氟化酯基团的聚合物是一种新型聚合物。使用这种聚合物可获得对 F2 准分子激光吸收率低的抗蚀剂组合物。
• SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1679314A1

  公开（公告）日：2006-07-12

  A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided. The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10. The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

  本发明提供了一种适用于作为化学放大抗蚀剂的树脂成分的新型聚硅氧烷，该抗蚀剂具有特别优异的 I-D 偏压和焦深（DOF）等性能；一种可用作合成该聚硅氧烷的原料的新型硅烷化合物；以及一种包含该聚硅氧烷的辐射敏感树脂组合物。 硅烷化合物如下式（I）所示、 而聚硅氧烷具有下式（1）所示的结构单元、 其中 R 是烷基，R1 和 R2 分别代表氟原子、低级烷基或低级氟烷基，n 是 0 或 1，k 是 1 或 2，i 是 0 至 10 的整数。 辐射敏感树脂组合物包括聚硅氧烷和光酸发生器。
• RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1726608A1

  公开（公告）日：2006-11-29

  A siloxane resin exhibiting high transparency at a wavelength of 193 nm or less, very suitable as a resin component in a radiation-sensitive resin composition useful particularly for manufacturing LSIs, and a radiation-sensitive resin composition useful as a chemically-amplified resist exhibiting excellent depth of focus (DOF) and capability of remarkably decreasing development defects are provided. The siloxane resin comprises the structural unit (I) shown by the following formula (I) and the structural unit (II) shown by the following formula (II) in the same molecule, the structural unit (I) and the structural unit (II) being included in an amount of more than 0 mol% but not more than 70 mol%, wherein A and B individually represents a divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a linear, branched, or cyclic alkyl group. The radiation-sensitive resin composition comprises (a) the siloxane resin and (b) a photoacid generator.

  本发明提供了一种在 193 纳米或更低波长下具有高透明度的硅氧烷树脂，它非常适合用作特别是用于制造 LSI 的辐射敏感树脂组合物中的树脂成分，还提供了一种用作化学放大抗蚀剂的辐射敏感树脂组合物，它具有优异的焦深（DOF）和显著减少显影缺陷的能力。 硅氧烷树脂在同一分子中包含下式（I）所示的结构单元（I）和下式（II）所示的结构单元（II），结构单元（I）和结构单元（II）的含量超过 0 摩尔%，但不超过 70 摩尔%、 其中 A 和 B 分别代表二价直链、支链或环状烃基，R1 代表一价酸可分解基团，R2 代表直链、支链或环状烷基。 辐射敏感树脂组合物包括 (a) 硅氧烷树脂和 (b) 光酸发生器。