o-nitrobenzyl N-methylcarbamate | 74109-34-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: o-nitrobenzyl N-methylcarbamate
• 英文别名: (2-nitrophenyl)methyl N-methylcarbamate
• CAS: 74109-34-5
• 化学式: C₉H₁₀N₂O₄
• 分子量: 210.189
• InChiKey: KHWCDPQWVYCOHU-UHFFFAOYSA-N

物化性质

• 沸点：
  364.4±25.0 °C(Predicted)
• 密度：
  1.290±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  84.2
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  邻硝基苯甲醇 、 异氰酸甲酯 在 吡啶 作用下， 反应 0.08h， 生成 o-nitrobenzyl N-methylcarbamate
  参考文献：
  名称：

  硝基苄基卤化物和氨基甲酸酯作为原型生物还原烷基化剂。

  摘要：

  制备了邻硝基苄基和对硝基苄基醇，卤化物和N-取代的氨基甲酸酯作为潜在的生物还原烷基化剂，并通过微分脉冲极谱法测量了这些化合物的前半波还原电势。这些试剂的细胞毒性通过在正常曝气和慢性缺氧条件下于37℃在0.01至500 microM的浓度下暴露于每种试剂1 h后确定EMT6肿瘤细胞的集落形成能力来进行检查。邻硝基苄基化合物对缺氧细胞的细胞毒性比对氧化细胞的细胞毒性大得多。推测这种选择性的细胞毒性是由低氧细胞对这些化合物进行更有效的生物还原活化后的烷基化引起的。

  DOI：

  10.1021/jm00182a027

文献信息

• COMPOUNDS AND METHODS FOR PURIFYING PEPTIDES PRODUCED BY SOLID PHASE PEPTIDE SYNTHESIS
  申请人：Aucagne Vincent

  公开号：US20120226019A1

  公开（公告）日：2012-09-06

  The invention relates to compounds which can be used for purifying peptides produced by solid phase peptide synthesis. In addition, the invention relates to methods for purifying peptides produced by solid phase peptide synthesis using the compounds according to the invention.

  本发明涉及可用于纯化固相肽合成产物的化合物。此外，本发明还涉及使用本发明中的化合物纯化固相肽合成产物的方法。
• NOVEL VINBLASTINE DERIVATIVES, THEIR PREPARATION, USE AND PHARMACEUTICAL COMPOSITIONS COMPRISING THE SAID DERIVATIVES
  申请人：Shanghai Institute of Materia Medica, Chinese Academy of Sciences

  公开号：EP2119720A1

  公开（公告）日：2009-11-18

  The invention provides vinblastine derivatives represented by the following formula 1 or their physiologically acceptable salts, their preparation, use and pharmaceutical compositions comprising the said derivatives. The said vinblastine derivatives show inhibiting activities against tumor cell lines and can be used as medicaments for treating malignant tumors.

  本发明提供了由下式 1 表示的长春新碱衍生物或其生理上可接受的盐、其制备方法、用途以及包含上述衍生物的药物组合物。上述长春新碱衍生物对肿瘤细胞株具有抑制活性，可用作治疗恶性肿瘤的药物。
• PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
  申请人：Toray Industries, Inc.

  公开号：EP3203320A1

  公开（公告）日：2017-08-09

  To provide a photosensitive resin composition which is capable of forming a pattern with high resolution and obtaining a cured film having excellent heat resistance and cracking resistance, and is also alkali developable; and a method capable of shortening the step required to remove a cured film of the composition after formation of an impurity region on a semiconductor substrate; and a method for manufacturing a semiconductor device using the same. Disclosed is a photosensitive resin composition including a polysiloxane (A), wherein the polysiloxane (A) is a polysiloxane represented by the general formula (1), and wherein (X) and (Y) are represented by the general formulas (4) to (6). 7.5≤X≤75 2.5≤Y≤40 1.5×Y≤X≤3×Y

  提供一种光敏树脂组合物，该组合物能够形成具有高分辨率的图案并获得具有优异的耐热性和抗裂性的固化膜，而且还可进行碱显影；提供一种方法，该方法能够缩短在半导体衬底上形成杂质区后去除该组合物固化膜所需的步骤；以及提供一种使用该组合物制造半导体器件的方法。公开了一种包括聚硅氧烷(A)的光敏树脂组合物，其中聚硅氧烷(A)是由通式(1)表示的聚硅氧烷，且(X)和(Y)由通式(4)至(6)表示。7.5≤x≤75 2.5≤y≤40 1.5×y≤x≤3×y
• Photosensitive resin composition, protective film, and liquid crystal display element
  申请人：Chi Mei Corporation

  公开号：US10162260B2

  公开（公告）日：2018-12-25

  The invention shows a photosensitive resin composition which can be used in protective film and liquid crystal display element and provides good transparency and high chemical resistance. The composition includes a complex resin (A), an o-naphthoquinone diazide sulfonate (B), and a solvent (C). The complex resin (A) includes a main chain and a side chain. The main chain includes a repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The side chain includes a repeating unit derived from siloxane based monomer (a2), and is bonded to the repeating unit derived from siloxane (meth)acrylate based monomer (a1-2). The complex resin (A) satisfies at least one of the following conditions (I) and (II): Condition (I): the main chain further includes a repeating unit derived from unsaturated monomer (a1-1) including a carboxylic acid or a carboxylic anhydride. Condition (II): the siloxane based monomer (a2) includes a monomer (a2-1) represented by formula (A-4).

  本发明展示了一种光敏树脂组合物，可用于保护膜和液晶显示元件，具有良好的透明性和高耐化学腐蚀性。该组合物包括复合树脂（A）、邻萘醌重氮磺酸盐（B）和溶剂（C）。复合树脂（A）包括一条主链和一条侧链。主链包括由硅氧烷（甲基）丙烯酸酯单体（a1-2）衍生的重复单元。侧链包括硅氧烷基单体（a2）衍生的重复单元，并与硅氧烷（甲基）丙烯酸酯基单体（a1-2）衍生的重复单元键合。复合树脂（A）至少满足以下条件（I）和（II）之一： 条件 (I)：主链还包括一个由不饱和单体（a1-1）衍生的重复单元，不饱和单体（a1-1）包括羧酸或羧酸酐。 条件（II）：硅氧烷基单体（a2）包括由式（A-4）表示的单体（a2-1）。
• Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device
  申请人：TORAY INDUSTRIES, INC.

  公开号：US10409163B2

  公开（公告）日：2019-09-10

  To provide a photosensitive resin composition which is capable of forming a pattern with high resolution and obtaining a cured film having excellent heat resistance and cracking resistance, and is also alkali developable; and a method capable of shortening the step required to remove a cured film of the composition after formation of an impurity region on a semiconductor substrate; and a method for manufacturing a semiconductor device using the same. Disclosed is a photosensitive resin composition including a polysiloxane (A).

  提供一种光敏树脂组合物，该组合物能够形成高分辨率的图案并获得具有优异耐热性和抗裂性的固化膜，而且还可进行碱显影；提供一种方法，该方法能够缩短在半导体衬底上形成杂质区后去除该组合物固化膜所需的步骤；以及提供一种使用该组合物制造半导体器件的方法。本发明公开了一种包括聚硅氧烷（A）的光敏树脂组合物。