申请人:——
公开号:US20040033434A1
公开(公告)日:2004-02-19
A compound shown by the general formula [1]
1
(wherein R
1
, R
2
and R
3
are each independently an aromatic hydrocarbon residual group, Y
n−
is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R
1
, R
2
and R
3
each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.
公式为[1]1的化合物被展示出来(其中R1、R2和R3各自独立地是芳香族碳氢残基,Yn−是源自具有3个或更多碳原子的羧酸的阴离子,其中含有取代的氟原子,n为1或2,前提是R1、R2和R3各自不是具有取代基的苯基,该取代基位于邻位和/或间位),并且由该化合物和一种二硫酰二氮化合物组成的组合物被公开。使用该化合物或该化合物作为酸发生剂用于光刻胶会产生改善超细图案轮廓或减少超细图案侧壁不规则性的效果。该化合物还可用作阳离子光聚合引发剂。