1,1,3,3,3-pentafluoro-2-propan-2-yl benzoate | 935442-11-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1,3,3,3-pentafluoro-2-propan-2-yl benzoate
• 英文别名: 1,1,1,3,3-Pentafluoropropan-2-yl benzoate
• CAS: 935442-11-8
• 化学式: C₁₀H₇F₅O₂
• 分子量: 254.156
• InChiKey: XVAXLPGOELCKLQ-UHFFFAOYSA-N

物化性质

• 沸点：
  210.1±40.0 °C(Predicted)
• 密度：
  1.349±0.06 g/cm3(Temp: 20 °C; Press: 760 Torr)(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.3
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为反应物：
  描述：

  1,1,3,3,3-pentafluoro-2-propan-2-yl benzoate 在 sodium hydrogensulfite 、 过氧化苯甲酰 作用下， 以 水 为溶剂， 反应 65.0h， 以43%的产率得到sodium 2-benzoyloxy-1,1,3,3,3-pentafluoropropanesulfonate
  参考文献：
  名称：

  Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process

  摘要：

  公开号：

  EP1780199B1

文献信息

• Methods for Producing Fluorine-Containing Hydroxyaldehyde, Fluorine-Containing Propanediol, and Fluorine-Containing Alcohol Monomer
  申请人：Central Glass Company, Limited

  公开号：US20150361026A1

  公开（公告）日：2015-12-17

  As shown by the following reaction formula, disclosed is a fluorine-containing hydroxyaldehyde production method, including the step of obtaining a fluorine-containing hydroxyaldehyde represented by the general formula (1) by reacting a fluorine-containing ketone represented by the general formula (4) and an aldehyde represented by the general formula (5) in the presence of an organic base selected from a heterocyclic compound which contains a nitrogen atom in its ring or a tertiary amine. By this production method, it is possible to obtain the fluorine-containing hydroxyaldehyde in a high yield. Furthermore, it is possible to easily obtain in high yields a fluorine-containing propanediol, which is a derivative of this fluorine-containing hydroxyaldehyde, and a fluorine-containing alcohol monomer by using the same.

  根据以下反应方程式，揭示了一种含氟羟基醛的生产方法，包括通过在选择的含氟酮（通式（4）表示）和醛（通式（5）表示）在含有从含有氮原子的杂环化合物或三级胺中选择的有机碱的情况下反应，获得由通式（1）表示的含氟羟基醛的步骤。通过这种生产方法，可以高产率地获得含氟羟基醛。此外，可以通过使用相同方法轻松高产率地获得含氟丙二醇（这是这种含氟羟基醛的衍生物）和含氟醇单体。
• Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method
  申请人：Central Glass Company, Ltd.

  公开号：US20040225159A1

  公开（公告）日：2004-11-11

  A fluorine-containing cyclic compound is represented by the formula 1: 1 wherein each of R 1 , R 2 and R 3 independently represents a hydrogen, alkyl group, fluorine, fluoroalkyl group or hexafluorocarbinol group, wherein at least one of the hexafluorocarbinol groups may partly or totally be protected with a protecting group, and wherein the protecting group is (a) a straight-chain, branched or cyclic hydrocarbon group having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group and optionally contains a fluorine atom, oxygen atom, nitrogen atom or carbonyl bond.

  含氟的环状化合物由以下式表示： 1 其中，R 1 ，R 2 和R 3 分别独立地表示氢、烷基、氟、氟烷基或六氟甲基团， 其中至少一个六氟甲基团可以部分或完全被保护基保护， 保护基为(a)具有碳原子数为1-25的直链、支链或环烃基团，或(b)芳香烃基团，可选地含有氟原子、氧原子、氮原子或羰基键。
• Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation
  申请人：Sumida Shinichi

  公开号：US20060270864A1

  公开（公告）日：2006-11-30

  The present invention provides a fluorine-containing cyclic compound represented by general formula (1): wherein R 1 represents a halogen atom, and R 2 and R 3 each represents hydrogen or a hydrocarbon group. The above-mentioned hydrocarbon group is a straight-chain, branched or cyclic hydrocarbon group having 1 to 25 carbon atoms or an aromatic hydrocarbon group, and may contain a halogen atom, an oxygen atom, a nitrogen atom or a sulfur atom. Further, a fluorine-containing polymerizable monomer derived from the above-mentioned fluorine-containing cyclic compound, a fluorine-containing polymer compound obtained by polymerization or copolymerization using the above-mentioned compound or monomer, further a resist material and a pattern forming process using the above-mentioned polymer compound are also disclosed. According to the invention, there is provided the polymer compound suitable for a resist material having high transparency in a wide wavelength region from an ultraviolet region to a near-infrared light region, high adhesion to a substrate, film forming properties, high etching resistance and a high glass transition point at once, particularly for a photoresist material in a vacuum ultraviolet wavelength region. Further, the pattern forming process using the polymer compound is suitable for the formation of a high-resolution pattern form.

  本发明提供了一种含氟环状化合物，其通式表示为（1）：其中R1表示卤素原子，R2和R3分别表示氢或碳氢基团。上述碳氢基团是直链、支链或环状碳氢基团，具有1至25个碳原子或芳香碳氢基团，并且可以含有卤素原子、氧原子、氮原子或硫原子。此外，本发明还揭示了由上述含氟环状化合物衍生的含氟可聚合单体、使用上述化合物或单体进行聚合或共聚合得到的含氟聚合物化合物，以及使用上述聚合物化合物的光刻胶材料和形成图案的工艺。根据本发明，提供了适用于具有从紫外区域到近红外光区域的宽波长范围内高透明度、高附着力、成膜性好、高蚀刻抗性和高玻璃化转变温度的光刻胶材料的聚合物化合物，特别是适用于真空紫外波长区域的光刻胶材料。此外，使用聚合物化合物的图案形成工艺适用于形成高分辨率图案。
• Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
  申请人：Komoriya Haruhiko

  公开号：US20110244188A1

  公开（公告）日：2011-10-06

  Disclosed is a polymerizable fluoromonomer represented by the following general formula (1). In the formula, R 1 represents a hydrogen atom, methyl group, fluorine atom, or trifluoromethyl group. n is an integer of 0 or 1, and m is that of from 1 to (3+n). R 2 and R 3 each independently represents a hydrogen atom or a protective group. A resist containing a fluoropolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure.

  本发明涉及一种可聚合的含氟单体，其通式（1）如下所示。其中，R1代表氢原子、甲基基团、氟原子或三氟甲基基团。n为0或1的整数，m为1至（3+n）的整数。R2和R3各自独立地代表氢原子或保护基团。通过聚合或共聚合该单体得到的含氟聚合物的抗蚀剂适用于浸润曝光或基于浸润曝光的双重图案化工艺的微细加工。
• Top Coating Composition
  申请人：Maeda Kazuhiko

  公开号：US20120040294A1

  公开（公告）日：2012-02-16

  Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R 1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R 2 represents a heat-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]

  本发明公开了一种用于保护光阻膜的顶层涂层组合物，该顶层涂层组合物是一种用于光刻胶的顶层涂层组合物，其特征在于包含具有以下一般式（1）所表示的重复单元的含氟聚合物。该组合物能够控制显影液的溶解性，并具有高度的防水性。[在公式中，R1表示氢原子、氟原子、甲基基团或三氟甲基基团，R2表示热敏保护基团，R3表示氟原子或含氟烷基团，W是双价连接基团。]