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N-ethyl-N'-allyl-N-hydroxy-thiourea | 1379222-61-3

中文名称
——
中文别名
——
英文名称
N-ethyl-N'-allyl-N-hydroxy-thiourea
英文别名
N-Aethyl-N'-allyl-N-hydroxy-thioharnstoff;Thiourea, N-ethyl-N-hydroxy-Na(2)-2-propen-1-yl-;1-ethyl-1-hydroxy-3-prop-2-enylthiourea
<i>N</i>-ethyl-<i>N</i>'-allyl-<i>N</i>-hydroxy-thiourea化学式
CAS
1379222-61-3
化学式
C6H12N2OS
mdl
——
分子量
160.24
InChiKey
OAYMEPAXWIICPI-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.7
  • 重原子数:
    10
  • 可旋转键数:
    3
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.5
  • 拓扑面积:
    67.6
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

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文献信息

  • INHIBITOR COMPOSITION FOR RACKS WHEN USING CHROME FREE ETCHES IN A PLATING ON PLASTICS PROCESS
    申请人:ENTHONE, INCORPORATED
    公开号:EP3059277A1
    公开(公告)日:2016-08-24
    The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.
    本发明涉及一种用于抑制聚合物表面电化学金属电镀的水性抑制组合物,所述抑制组合物包含一种选自至少有一个硫原子和至少有一个氮原子的化合物组的抑制剂,还涉及一种抑制机架绝缘表面的方法。本发明的抑制剂组合物能够提供一种解决方案,当在塑料电镀工艺中使用非变色蚀刻法时,禁止在机架的绝缘区域出现意外金属化。
  • Inhibitor Composition for Racks When Using Chrome Free Etches in a Plating on Plastics Process
    申请人:MACDERMID ENTHONE, INC.
    公开号:US20180044813A1
    公开(公告)日:2018-02-15
    The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.
  • [EN] INHIBITOR COMPOSITION FOR RACKS WHEN USING CHROME FREE ETCHES IN A PLATING ON PLASTICS PROCESS<br/>[FR] COMPOSITION INHIBITRICE POUR GRILLES LORS DE L'UTILISATION DE GRAVURES EXEMPTES DE CHROME DANS UN PROCESSUS DE PLACAGE SUR MATIÈRES PLASTIQUES
    申请人:ENTHONE
    公开号:WO2016137943A1
    公开(公告)日:2016-09-01
    The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.
  • Kjellin; Kuylenstjerna, Justus Liebigs Annalen der Chemie, 1897, vol. 298, p. 119,122
    作者:Kjellin、Kuylenstjerna
    DOI:——
    日期:——
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