申请人:Hoechst-Roussel Pharmaceuticals Incorporated
公开号:US05229388A1
公开(公告)日:1993-07-20
There are disclosed compounds of the formula, ##STR1## where n is 0, 1 or 2; A is ##STR2## where X in each occurrence is independently hydrogen, halogen, loweralkyl, hydroxy, nitro, loweralkoxy, amino, cyano, trifluoromethyl or methylthio; Y in each occurrence is independently hydrogen, halogen, loweralkyl, hydroxy, nitro, loweralkoxy, amino, cyano, trifluoromethyl or methylthio; m is 1 or 2; k is 1 or 2; R.sub.1 and R.sub.2 are independently hydrogen, loweralkyl, ##STR3## or aryl except that when R.sub.1 is ##STR4## or aryl, R.sub.2 is hydrogen, or alternatively R.sub.1 +R.sub.2 taken together with the carbon atom to which they are attached form a cyclopentane, cyclohexane, cycloheptane, pyran, thiopyran, indan or piperidine ring; R.sub.3 and R.sub.4 are independently hydrogen or loweralkyl, or alternatively R.sub.3 +R.sub.4 taken together with the carbon atom to which they are attached form a cyclopentane, cyclohexane, cycloheptane, pyran, thiopyran, pyrrolidine or piperidine ring, the term aryl signifying an unsubstituted phenyl group or a phenyl group substituted with 1, 2 or 3 substituents each of which being independently loweralkyl, loweralkoxy, hydroxy, halogen, loweralkylthio, cyano, amino or trifluoromethyl, which are useful as antipsychotic, analgesic, anticonvulsant and anxiolytic agents.
公式中披露了化合物,其中n为0、1或2;A为其中X在每次出现时独立地为氢、卤素、较低烷基、羟基、硝基、较低烷氧基、氨基、氰基、三氟甲基或甲硫基;Y在每次出现时独立地为氢、卤素、较低烷基、羟基、硝基、较低烷氧基、氨基、氰基、三氟甲基或甲硫基;m为1或2;k为1或2;R.sub.1和R.sub.2独立地为氢、较低烷基、或芳基,但当R.sub.1为或芳基时,R.sub.2为氢,或者R.sub.1 +R.sub.2与它们附着的碳原子一起形成环戊烷、环己烷、环庚烷、吡喃、硫代吡喃、茚或哌啶环;R.sub.3和R.sub.4独立地为氢或较低烷基,或者R.sub.3 +R.sub.4与它们附着的碳原子一起形成环戊烷、环己烷、环庚烷、吡喃、硫代吡喃、吡咯烷或哌啶环,术语芳基表示未取代的苯基或一个苯基,其上取代基为1、2或3个,每个取代基独立地为较低烷基、较低烷氧基、羟基、卤素、较低烷硫基、氰基、氨基或三氟甲基,这些化合物可用作抗精神病、镇痛、抗癫痫和抗焦虑药物。