(E)-4-(3,5-dimethoxystyryl)-N,N-diethylaniline | 1415605-03-6

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二苯乙烯类
• 英文名称: (E)-4-(3,5-dimethoxystyryl)-N,N-diethylaniline
• 英文别名: 4-[(E)-2-(3,5-dimethoxyphenyl)ethenyl]-N,N-diethylaniline
• CAS: 1415605-03-6
• 化学式: C₂₀H₂₅NO₂
• 分子量: 311.424
• InChiKey: XPVQYPPOTVZJHY-BQYQJAHWSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  23
• 可旋转键数：
  7
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.3
• 拓扑面积：
  21.7
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  (E)-4-(3,5-dimethoxystyryl)-N,N-diethylaniline 在 三溴化硼 作用下， 以 二氯甲烷 为溶剂， 以75%的产率得到5-[(E)-2-[4-(diethylamino)phenyl]ethenyl]benzene-1,3-diol
  参考文献：
  名称：

  Design, synthesis, and evaluation of resveratrol derivatives as Aß1–42 aggregation inhibitors, antioxidants, and neuroprotective agents

  摘要：

  A series of novel resveratrol derivatives were designed, synthesised and evaluated as potential therapeutic agents for the treatment of Alzheimer's disease. Among these compounds, compound 7l, (E)-5-(4-(isopropylamino)styryl)benzene-1,3-diol, exhibited potent beta-amyloid aggregation inhibition activity, which was confirmed by a ThT fluorescence assay (71.65% at 20 mu M) and transmission electron microscopy (TEM). Compound 7l also exhibited good antioxidant activity (4.12 Trolox equivalents in an oxygen radical absorbance capacity assay and a 37% reduction in reactive oxygen species in cells at 10 mu M). The cytotoxicity analysis of compounds 7f, 7i, 7j and 7l indicated that these compounds have lower toxicities than resveratrol at 60 mu M. (C) 2012 Elsevier Ltd. All rights reserved.

  DOI：

  10.1016/j.bmcl.2012.09.105
• 作为产物：
  描述：

  3,5-二甲氧基苄醇 在 吡啶 、 氯化亚砜 、 sodium hydride 作用下， 以 四氢呋喃 、 二氯甲烷 为溶剂， 反应 19.67h， 生成 (E)-4-(3,5-dimethoxystyryl)-N,N-diethylaniline
  参考文献：
  名称：

  含氮二苯乙烯的设计、合成、细胞毒活性和计算机研究

  摘要：

  在本研究中，设计、合成了五个系列的45种含氮二苯乙烯，包括35种新化合物，并测定了其对两种人肿瘤细胞系（K562细胞和MDA-MB-231细胞）和正常细胞系（L-02细胞）的细胞毒活性。 ）。构效关系表明， N , N-二甲氨基的引入增强了对K562细胞的细胞毒性，并且含有N-甲基哌嗪的化合物对MDA-MB-231细胞表现出更强的效力。其中，化合物NS1i对K562细胞具有极强的细胞毒性，IC 50值为0.93 μM，并且对正常细胞活力具有优异的选择性。此外，计算机靶点预测和分子对接证明醌还原酶2可能是NS1i的潜在靶点。总之，含氮二苯乙烯为发现新型高效抗癌药物提供了巨大的潜力，NS1i可能作为一个有前景的先导化合物值得进一步研究。

  DOI：

  10.1016/j.fitote.2023.105625

文献信息

• Multi-photon reacted articles with inorganic particles and method for fabricating structures
  申请人：Leatherdale Catherine A.

  公开号：US20090035528A1

  公开（公告）日：2009-02-05

  A three-dimensional shaped structure is prepared from a multi-photon reactive composition including: (a) at least one reactive species; (b) a multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.

  使用多光子反应组成物制备出三维形状的结构，该组成物包括：(a) 至少一种反应物种；(b) 多光子光引发剂系统；以及 (c) 多个基本无机颗粒，其中颗粒的平均粒径小于约10微米。
• MULTI-PHOTON REACTIVE COMPOSITIONS WITH INORGANIC PARTICLES AND METHOD FOR FABRICATING STRUCTURES
  申请人：Leatherdale A. Catherine

  公开号：US20070264501A1

  公开（公告）日：2007-11-15

  A multi-photon reactive composition including: (a) at least one reactive species; and (b) multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.

  一种多光子反应组合物，包括：（a）至少一种反应性物质；和（b）多光子光引发剂系统；以及（c）多个基本上无机颗粒，其中颗粒的平均粒径小于约10微米。
• LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES
  申请人：3M Innovative Properties Company

  公开号：EP3077421B1

  公开（公告）日：2018-01-31
• Process for Producing Photonic Crystals and Controlled Defects Therein
  申请人：Anderson T. Mark

  公开号：US20070282030A1

  公开（公告）日：2007-12-06

  A process comprises (a) providing a substantially inorganic photoreactive composition comprising (1) at least one cationically reactive species, (2) a multi-photon photoinitiator system, and 10 (3) a plurality of precondensed, inorganic nanoparticles; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; (c) exposing at least a portion of the non-reacted portion of the photoreactive composition to radiation of appropriate wavelength and intensity to cause multi-photon absorption and photoreaction to form additional reacted portion; (d) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space; and (e) at least partially filling the interstitial void space with at least one material having a refractive index that is different from the refractive index of the remaining portion.
• US7265161B2
  申请人：——

  公开号：US7265161B2

  公开（公告）日：2007-09-04