p,p'-Diazido-m,m'-dimethylbiphenyl | 65995-50-8

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: p,p'-Diazido-m,m'-dimethylbiphenyl
• 英文别名: 4,4′-diazido-3,3′-dimethyl-1,1′-biphenyl；3-[3,3'-Dimethyl-4'-(triaz-2-yn-2-ium-1-ylidene)[1,1'-bi(cyclohexa-2,5-dien-1-ylidene)]-4-ylidene]triaz-1-en-1-ide；[[4-(4-diazonioimino-3-methylcyclohexa-2,5-dien-1-ylidene)-2-methylcyclohexa-2,5-dien-1-ylidene]hydrazinylidene]azanide
• CAS: 65995-50-8
• 化学式: C₁₄H₁₂N₆
• 分子量: 264.289
• InChiKey: ZFDKNVBYIDMZFC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  20
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  66.2
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  4-(2-hydroxyphenyl)-1-(prop-2-yn-1-yl)-1,5-benzodiazepin-2-one 、 p,p'-Diazido-m,m'-dimethylbiphenyl 在 copper(l) iodide 、 N,N-二异丙基乙胺 作用下， 以 N,N-二甲基甲酰胺 为溶剂， 反应 0.2h， 以81%的产率得到1,1'-((1,1'-(3,3'-dimethyl-[1,1'-biphenyl]-4,4'-diyl)bis(1H-1,2,3-triazole-4,1-diyl))bis(methylene))bis(1,5-benzodiazepin-2-one)
  参考文献：
  名称：

  Design and microwave-assisted synthesis of dimers of 1,5-benzodiazepine-1,2,3-triazole hybrids bearing alkyl/aryl spacers and their biological assessment

  摘要：

  Large series of novel N-bis-1,2,3-triazolo-linked-1,5-benzodiazepin-2-ones (BZD) have been synthesized under microwave irradiation through a Cu(I)-catalyzed double 1,3-dipolar alkyne-azide coupling reaction. This process is of considerable synthetic advantages in terms of time saving and remarkable yields. The chemical structures of the isolated compounds have been elucidated on the basis of extensive spectroscopic methods including 1D & 2D NMR, IR and HRMS. All the synthesized compounds have been evaluated for their antimicrobial and antioxidant activities. In vitro antimicrobial environment, almost all of compounds have shown an interesting activity. Among the dimers of 1,5-benzodiazepine-1,2,3-triazole compounds tested, the results revealed that the potent antibacterial was recorded to compounds 3g,l for Gram-positive (within MIC = 31.25 and 125 mu g/mL), and 3h,k for Gram-negative (within MIC = 31.25 and 125 mu g/mL). Besides, the results demonstrate that compounds 3h,k have demonstrated the strongest potential against all the tested fungus (within MIC = 62.5 and 125 mu g/mL). The antioxidant evaluation indicated that most compounds exhibited a moderate to good biological activity. (C) 2019 Elsevier B.V. All rights reserved.

  DOI：

  10.1016/j.molstruc.2019.06.018
• 作为产物：
  描述：

  4,4'-二氨基-3,3'-二甲基联苯 在 盐酸 、 sodium azide 、 sodium nitrite 作用下， 生成 p,p'-Diazido-m,m'-dimethylbiphenyl
  参考文献：
  名称：

  Sauer, E.; Schopf, G.; Czarnetzki, K., Zeitschrift fur Physikalische Chemie (Leipzig), 1989, vol. 270, # 6, p. 1185 - 1195

  摘要：

  DOI：

文献信息

• Solvent-soluble organopolysilsesquioxanes, processes for producing the same, and compositions and semiconductor devices using the same
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0076656A2

  公开（公告）日：1983-04-13

  An organopolysilsesquioxane having lower alkyl groups and alkenyl groups and, if necessary, aryl groups and/or hydrogen atoms bonded as the side chains can be produced by adding water to a solution of a lower-alkyltrihalosilane, an alkenyltrihalosilane, and, if necessary, an aryltrihalosilane and/or a trihalosilane in an organic solvent, and heating the resulting mixture. The aforesaid organopolysilsesquioxane can be used for forming a patterned surface-protecting layer or insulating layer for a semiconductor device, optionally in the form of a mixture with a compound which generates a crosslinking-reaction-active species upon irradiation with light or ionizing radiation.

  将水加到低烷基三卤硅烷、烯基三卤硅烷、芳基三卤硅烷和/或三卤硅烷在有机溶剂中的溶液中，并加热得到的混合物，可以制得具有低级烷基和烯基基团，必要时还具有芳基基团和/或氢原子键作为侧链的有机聚硅烷基二氧杂环戊烷。上述有机聚硅氧烷可用于形成半导体器件的图案化表面保护层或绝缘层，可选择与一种化合物混合的形式，该化合物在光或电离辐射照射下会产生交联反应活性物质。
• Radiation-sensitive resin composition
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0211667A2

  公开（公告）日：1987-02-25

  A radiation-sensitive resin composition comprises a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storgage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.

  一种辐射敏感树脂组合物由一种碱溶性树脂和一种辐射敏感化合物在一种由单氧一羧酸酯组成的溶剂中的溶液组成。 这种组合物具有很高的储存稳定性（即在储存过程中形成极少量的细小颗粒），适合用作制造集成电路的抗蚀剂。
• PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME
  申请人：Kansai Research Institute (KRI)

  公开号：EP0962825A1

  公开（公告）日：1999-12-08

  A photosensitive resin composition comprises a base resin (e.g., novolak resins, polyvinylphenol-series polymers), a first photoactive ingredient (e.g., diazobenzoquinone derivatives, diazonaphthoquinone derivatives) and a second photoactive ingredient (e.g., mixtures with azide compounds) each having an absorption range at wavelength λ1 or λ2, the wavelengths thereof being different from each other. Between the first and second photoactive ingredients, at least one photoactive ingredient is substantially inert at the absorption wavelength of the other. After exposing the photosensitive resin composition to a light to form a pattern, the whole surface of the photosensitive layer is exposed to a light of the other wavelength to make the surface hardly soluble (in the case a positive pattern is formed) or readily soluble (in the case a negative pattern is formed) in a developer, and developed, thereby forming a pattern of high resolution. Utilizing an existing exposure system, there can be obtained photosensitive resin compositions (especially, resists for semiconductor production) having improved sensitivity and resolution.

  光敏树脂组合物包括基体树脂（如酚醛树脂、聚乙烯基苯酚系列聚合物）、第一种光活性成分（如重氮苯醌衍生物、重氮萘醌衍生物）和第二种光活性成分（如与叠氮化合物的混合物），每种光活性成分在波长λ1或λ2处均有吸收范围，其波长互不相同。在第一种和第二种光活性成分之间，至少有一种光活性成分在另一种光活性成分的吸收波长处基本上是惰性的。将感光树脂组合物曝光形成图案后，将感光层的整个表面曝光在另一波长的光下，使其表面难溶于显影剂（在形成正图案的情况下）或易溶于显影剂（在形成负图案的情况下），然后进行显影，从而形成高分辨率的图案。利用现有的曝光系统，可以获得具有更高灵敏度和分辨率的光敏树脂组合物（特别是用于半导体生产的抗蚀剂）。
• Single versus Double Cu(I) Catalyzed [3 + 2] Azide/Platinum Diacetylide Cycloaddition Reactions
  作者：Xi Yang、Sudarsan VenkatRamani、Christopher C. Beto、Trevor J. Del Castillo、Ion Ghiviriga、Khalil A. Abboud、Adam S. Veige

  DOI：10.1021/acs.organomet.7b00067

  日期：2017.4.10

  This report focuses on Cu(I) catalyzed cycloaddition reactions between organic azides and the platinum diacetylide complexes trans-(PR3)(2)Pt(C=CR')(2) (where PR3 = P(OEt)(3), PEt3, (PBu3)-Bu-n, PPhMe2, PPh3, and PBn3; and R' = H, Ph, and p-PhNO2). Pt(II)-Diacetylides supported by P(OEt)(3), PEt3, (PBu3)-Bu-n, and PPhMe2 react with benzyl azide to provide syn/anti isomers of double cycloaddition products. In contrast, Pt(II)-diacetylide complexes supported by PPh3 and PBn3 afford single cycloaddition products, exclusively. Steric congestion enforced by the larger phosphines PPh3 and PBn3 prevent the second cycloaddition. Ground state DFT computations provide some insight into the divergent reactivity and indicate that the pi-acidity of the phosphine ligands is a variable in the single vs double cycloaddition outcome.
• Photoresist composition
  申请人：JAPAN SYNTHETIC RUBBER CO., LTD.

  公开号：EP0068808B1

  公开（公告）日：1985-06-05