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3-(三氯甲基)苯甲酸 | 27466-80-4

中文名称
3-(三氯甲基)苯甲酸
中文别名
——
英文名称
3-trichloromethyl-benzoic acid
英文别名
31.31.31-Trichlor-m-toluylsaeure;3-Trichlormethyl-benzoesaeure;3-Carboxy-benzotrichlorid;m-(Trichlormethyl)benzoic-acid;3-(Trichloromethyl)benzoic acid
3-(三氯甲基)苯甲酸化学式
CAS
27466-80-4
化学式
C8H5Cl3O2
mdl
——
分子量
239.485
InChiKey
VZVCBWSPQNDGFN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    348.7±42.0 °C(Predicted)
  • 密度:
    1.562±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    3.7
  • 重原子数:
    13
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.12
  • 拓扑面积:
    37.3
  • 氢给体数:
    1
  • 氢受体数:
    2

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • PROCESS FOR PRODUCING ESTER COMPOUND
    申请人:Imazeki Shigeaki
    公开号:US20100324314A1
    公开(公告)日:2010-12-23
    PROBLEM To provide an environmentally-friendly method for producing industrially an ester compound. SOLUTION The present invention is a method for producing an ester compound which comprises subjecting a carboxylic acid and an alcohol to dehydration-condensation reaction using an involatile acid catalyst and then removing the residual acid catalyst by bringing a weak basic substance into contact with the residual acid catalyst.
    问题提供一种生产工业酯化合物的环保方法。 解决方案是一种生产酯化合物的方法,包括将羧酸和醇经过脱水缩合反应,使用一种不挥发的酸催化剂,然后通过将弱碱性物质与残留的酸催化剂接触来去除残留的酸催化剂。
  • Heterocycle-bearing onium salts
    申请人:Ishihara Masami
    公开号:US20050233253A1
    公开(公告)日:2005-10-20
    The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides “a heterocycle-containing onium salt shown by the general formula [1]: [wherein R is a group shown by the general formula [2]: (wherein R 3 and R 4 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 2 is an oxygen atom or a sulfur atom; i is an integer of 0 to 4; and j is an integer of 0 to 3), or a group shown by the general formula [3]: (wherein R 5 and R 6 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; X 3 and X 4 are each independently an oxygen atom or a sulfur atom; p is an integer of 0 to 2; and q is an integer of 0 to 3); R 1 and R 2 are each independently a halogen atom, an alkyl group which may have a halogen atom or an aryl group as a substituent, or an aryl group which may have a halogen atom or a lower alkyl group as a substituent; m and n are each independently an integer of 0 to 5; and A is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]: HM 1 (R 7 ) 4 [4] (wherein M 1 is a boron atom or a gallium atom; and R 7 is an aryl group which may have a substituent selected from a lower haloalkyl group, a halogen atom, a nitro group and a cyano group)]” or “a heterocycle-containing onium salt shown by the general formula [35]: [wherein R 26 and R 27 are each independently an aryl group which may have a halogen atom or a lower alkyl group as a substituent, a group shown by the above-mentioned general formula [2], or a group shown by the above-mentioned general formula [3]; and A 3 is a halogen atom or an anion derived from an inorganic strong acid, an organic acid or a compound shown by the general formula [4]; and provided that at least one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], and when only one of R 26 and R 27 is a group shown by the above-mentioned general formula [2] or [3], A 3 is an anion derived from an inorganic strong acid shown by the general formula [36]; HM 3 F 6 [36] (wherein M 3 is a phosphorus atom, an arsenic atom or an antimony atom), an organic acid or a compound shown by the general formula [4]]”.
    本发明涉及一种含杂环离子盐,例如,用作阳离子光聚合引发剂和化学增感抗蚀剂的酸发生剂,并提供“一种由通式[1]所示的含杂环离子盐:[其中R是由通式[2]所示的基团:(其中R3和R4分别独立地是卤素原子,可能具有卤素原子或芳基取代基的烷基基团,或可能具有卤素原子或较低烷基基团的芳基基团;X2是氧原子或硫原子;i是0到4的整数;j是0到3的整数),或由通式[3]所示的基团:(其中R5和R6分别独立地是卤素原子,可能具有卤素原子或芳基取代基的烷基基团,或可能具有卤素原子或较低烷基基团的芳基基团;X3和X4分别独立地是氧原子或硫原子;p是0到2的整数;q是0到3的整数);R1和R2分别独立地是卤素原子,可能具有卤素原子或芳基取代基的烷基基团,或可能具有卤素原子或较低烷基基团的芳基基团;m和n分别独立地是0到5的整数;A是从无机强酸,有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子:HM1(R7)4[4](其中M1是硼原子或镓原子;R7是可能选择自较低卤代烷基基团、卤素原子、硝基基团和氰基团的芳基基团)]”或“一种由通式[35]所示的含杂环离子盐:[其中R26和R27分别独立地是可能具有卤素原子或较低烷基基团的芳基基团,上述通式[2]所示的基团或上述通式[3]所示的基团;A3是从无机强酸,有机酸或由通式[4]所示的化合物得到的卤素离子或阴离子;并且至少其中之一的R26和R27是上述通式[2]或[3]所示的基团,当仅R26和R27中的一个是上述通式[2]或[3]所示的基团时,A3是从通式[36]所示的无机强酸得到的阴离子:HM3F6[36](其中M3是磷原子、砷原子或锑原子),有机酸或由通式[4]所示的化合物]”。
  • DE707955
    申请人:——
    公开号:——
    公开(公告)日:——
  • HETEROCYCLE-BEARING ONIUM SALTS
    申请人:Wako Pure Chemical Industries, Ltd.
    公开号:EP1481973B1
    公开(公告)日:2008-12-31
  • A heterocycle-containing onium salt
    申请人:Wako Pure Chemical Industries, Ltd.
    公开号:EP1953149B1
    公开(公告)日:2010-10-06
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