申请人:Fukui Hiroji
公开号:US20110097669A1
公开(公告)日:2011-04-28
The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group,
where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.
本发明提供了一种光固化组合物,其包含一种光碱发生剂,当短时间内用少量光照射时,能够生成足量碱,并且具有高量子产率,同时含有一种可固化化合物,该化合物能够被生成的碱迅速固化,从而使组合物固化成为固化产物。该光固化组合物包括:光碱发生剂(A),其是由下式(1-1)所表示的羧酸盐(a1-1)与碱性化合物(a2)形成的,以及一种可固化化合物(B),该化合物在一个分子中具有至少两种官能团,所述官能团选自环氧基团、(甲基)丙烯酰基团、异氰酸酯基团、酸酐基团和烷氧基硅基团,其中上述式(1-1)中的R1至R7分别为氢或有机基团,R1至R7可以相同或不同,其中两个R1至R7可以相互连接形成环结构。