[(Z)-[(5E)-5-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] propane-1-sulfonate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [(Z)-[(5E)-5-[cyano-(2-methylphenyl)methylidene]thiophen-2-ylidene]amino] propane-1-sulfonate
• 化学式: C₁₆H₁₆N₂O₃S₂
• 分子量: 348.4
• InChiKey: PLGWCXKQZVGGJA-JNDPSPENSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  23
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  113
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• Pretreatment compositions
  申请人：Powell B. David

  公开号：US20060286484A1

  公开（公告）日：2006-12-21

  A pretreatment composition of: (a) at least one compound having structure VI V 1 —Y—V 2 VI wherein Y is selected from the group consisting of S, O, NR 2 , (HOCH) p , and each R 1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R 2 is independently H, SH, CH 3 , C 2 H 5 , and a linear or branched C 1 -C 4 alkyl group containing a thiol group; and wherein V 1 and V 2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can =0 only when Y═ n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R 1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.

  预处理组合物包括：(a)至少一种具有结构VIV1—Y—V2VI的化合物，其中Y选自S、O、NR2、(HOCH)p和each R1，每个R1独立选自H、烷基、烯基、炔基、烷氧基或卤素，每个R2独立为H、SH、CH3、C2H5和含巯基的直链或支链C1-C4烷基；其中V1和V2独立选自，其中m独立为0到4的整数，条件是m只能为0当Y=n为1到5的整数；p为1到4的整数，每个R1如上定义；(b)至少一种有机溶剂，以及可选地(c)至少一种促进粘附的物质；其中，组合物中存在的结构VI化合物的量足以抑制光敏组合物涂布在基材上并在涂覆的基材上形成图像时形成残留物。
• [EN] LATENT ACIDS AND THEIR USE<br/>[FR] ACIDES LATENTS ET LEUR UTILISATION
  申请人：BASF SE

  公开号：WO2016124493A1

  公开（公告）日：2016-08-11

  Compounds of the formula (I) and (IA) wherein X is -O(CO)-; R1 is C1-C12haloalkyl or C6-C10haloaryl; R2 is located in position 7 of the coumarinyl ring and is OR8; R2a, R2b and R2C independently of each other are hydrogen; R3 is C1-C8haloalkyl or C1-C8haloalkyl; R4 is hydrogen; and R8 is C1-C6alkyI; are suitable as photosensitive acid donors in the preparation of photoresist compositions such as used for example in the preparation of spacers, insulating layers, interlayer dielectric films, insulation layers, planarization layers, protecting layers, overcoat layers, banks for electroluminescence displays and liquid crystal displays (LCD).

  化合物的化学式（I）和（IA），其中X为-O(CO)-；R1为C1-C12卤代烷基或C6-C10卤代芳基；R2位于香豆素环的第7位，为OR8；R2a、R2b和R2C彼此独立地为氢；R3为C1-C8卤代烷基或C1-C8卤代烷基；R4为氢；R8为C1-C6烷基，适用于作为感光酸给体，用于制备光刻胶组合物，例如用于制备间隔层、绝缘层、层间介质膜、绝缘层、平坦化层、保护层、覆盖层、电致发光显示器和液晶显示器（LCD）的制备。
• [EN] SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS<br/>[FR] DÉRIVÉS DE SULFONIUM ET LEUR UTILISATION EN TANT QU'ACIDES LATENTS
  申请人：BASF SE

  公开号：WO2010046240A1

  公开（公告）日：2010-04-29

  Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).

  化合物的公式（I），其中Ar1例如是未取代或取代的苯基或联苯基; Ar2和Ar3例如是独立的苯基，萘基，联苯基或杂环基，均可选取代; 或者例如Ar1和Ar2与直接键，O，S或（CO）一起形成融合的环系统; R例如是氢，C3-C30环烷基或C1-C18烷基; R1，R2和R3独立地例如是C1-C10卤代烷基; 是有效的光酸发生剂（PAG）。
• [EN] SULPHONIUM SALT INITIATORS<br/>[FR] INITIATEURS À BASE DE SELS DE SULFONIUM
  申请人：CIBA HOLDING INC

  公开号：WO2009047151A1

  公开（公告）日：2009-04-16

  Compounds of the formula (I), wherein X is a single bond, CRaRb O, S, NRC, NCORC, CO, SO or SO2; L, L1, L2, L3, L4, L5, L6, L7 and L8 are for example hydrogen, R1 or COT; T denotes T1 or O-T2; T1 and T2 for example are hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5- C12cycloalkenyl, C6-C14aryl, C3-C12heteroaryl, C1-C20alkyl substituted by one or more D, C2- C20alkyl interrupted by one or more E, C2-C20alkyl substituted by one or more D and inter- rupted by one or more E or Q; R1, R2, R3, R4, Ra, Rb and Rc are T1; D is for example R5, OR5, SR5 or Q1; E is for example O, S, COO or Q2; R5 and R6 for example are hydrogen, C1- C12alkyl or phenyl; Q is for example C6-C12bicycloalkyl, C6-C12bicycloalkenyl or C6- C12tricycloalkyl; Q1 is for example, C6-C14aryl or C3-C12heteroaryl; Q2 is for example C6- C14arylene or C3-C12heteroarylene; Y is an anion; and M is a cation; provided that at least one of L, L1, L2, L3, L4, L5, L6, L7 and L8 is other than hydrogen; and provided that (i) at least one of T1 or T2 is a group Q; or (ii) at least one D is a group Q1; or (iii) at least one E is a group Q2; are suitable as photolatent catalysts.

  化合物的式子（I），其中X是单键，CRaRb O，S，NRC，NCORC，CO，SO或SO2; L，L1，L2，L3，L4，L5，L6，L7和L8例如是氢，R1或COT; T表示T1或O-T2; T1和T2例如是氢，C1-C20烷基，C3-C12环烷基，C2-C20烯基，C5-C12环烯基，C6-C14芳基，C3-C12杂芳基，被一个或多个D取代的C1-C20烷基，被一个或多个E中断的C2-C20烷基，被一个或多个D取代并被一个或多个E或Q中断的C2-C20烷基; R1，R2，R3，R4，Ra，Rb和Rc是T1; D例如是R5，OR5，SR5或Q1; E例如是O，S，COO或Q2; R5和R6例如是氢，C1-C12烷基或苯基; Q例如是C6-C12双环烷基，C6-C12双环烯基或C6-C12三环烷基; Q1例如是C6-C14芳基或C3-C12杂芳基; Q2例如是C6-C14芳撑基或C3-C12杂芳撑基; Y是阴离子; M是阳离子; 前提是L，L1，L2，L3，L4，L5，L6，L7和L8中至少有一个不是氢; 并且前提是（i）至少有一个T1或T2是Q组; 或（ii）至少有一个D是Q1组; 或（iii）至少有一个E是Q2组; 适用于光潜催化剂。
• Latent acids and their use
  申请人：Yamato Hitoshi

  公开号：US20110217654A1

  公开（公告）日：2011-09-08

  The invention pertains to a compound generating an acid of the formula I or II, for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes wherein X is CH 2 or CO; Y is O, NR 4 , S, O(CO), O(CO)O, O(CO)NR 4 , OSO 2 , O(CS), or O(CS)NR 4 ; R 1 is for example C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 2 -C 18 alkyl, interrupted C 3 -C 30 cycloalkyl, interrupted C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, interrupted C 4 -C 30 cycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, biphenylyl, fluorenyl or heteroaryl, all unsubstituted or are substituted; or R 1 is NR 12 R 13 ; R 2 and R 3 are for example C 3 -C 30 cycloalkylene, C 3 -C 30 cycloalkyl-C 1 -C 18 alkylene, C 1 -C 18 alkylene, C 1 -C 10 haloalkylene, C 2 -C 12 alkenylene, C 4 -C 30 cycloalkenylene, phenylene, naphthylene, anthracylene, phenanthrylene, biphenylene or heteroarylene; all unsubstituted or substituted; R 4 is for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl; R 12 and R 13 are for example C 3 -C 30 cycloalkyl, C 3 -C 30 cycloalkyl-C 1 -C 18 alkyl, C 1 -C 18 alkyl, C 1 -C 10 haloalkyl, C 2 -C 12 alkenyl, C 4 -C 30 cycloalkenyl, phenyl-C 1 -C 3 -alkyl, Ar, (CO)R 15 , (CO)OR 15 or SO 2 R 15 ; and Ar is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl or heteroaryl, all unsubstituted or substituted.

  本发明涉及一种生成公式I或II的酸的化合物，例如对应的磺鎓盐和碘鎓盐，以及对应的磺酰氧肟，其中X为CH2或CO；Y为O、NR4、S、O（CO）、O（CO）O、O（CO）NR4、OSO2、O（CS）或O（CS）NR4；R1例如为C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、C3-C30环烷基、C3-C30环烷基-C1-C18烷基、中断的C2-C18烷基、中断的C3-C30环烷基、中断的C3-C30环烷基-C1-C18烷基、中断的C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；或R1为NR12R13；R2和R3例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基、萘基、蒽基、菲基、苯并二氢呋喃基或杂环基，全部未取代或被取代；R4例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基；R12和R13例如为C3-C30环烷基、C3-C30环烷基-C1-C18烷基、C1-C18烷基、C1-C10卤代烷基、C2-C12烯基、C4-C30环烯基、苯基-C1-C3-烷基、Ar、（CO）R15、（CO）OR15或SO2R15；Ar为苯基、苯并二氢呋喃基、菲基、萘基、蒽基、苯并蒽基或杂环基，全部未取代或被取代。