Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
申请人:International Business Machines
Corporation
公开号:EP0422570A2
公开(公告)日:1991-04-17
An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula:
wherein X is CH=CH₂ or -(-CH₂-)-n0-(-R) with R being H or
wherein each RI, RII and RIII individually is selected from the group of alkyl, alkenyl, aryl,
wherein each RIV, RV and RVI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.
一种紫外光敏感型光引发剂组合物,其中包括至少一种由式表示的蒽衍生物:
其中 X 是 CH=CH₂ 或-(-CH₂-)-n0-(-R),R 是 H 或
其中每个 RI、RII 和 RIII 单独选自烷基、烯基和芳基组、
其中每个 RIV、RV 和 RVI 单独选自烷基、烯基和芳基组;其中 m 为 0 至 4 的整数,p 为 0 至 4 的整数,n 为 1 至 2;以及鎓盐和有机溶剂。该组合物可用于阳离子可聚合材料的阳离子聚合,包括光刻胶图案的形成。此外,还提供了某些新型环氧官能化有机硅,这些有机硅对辐射(包括电子束辐射)敏感,并表现出抗氧活性离子蚀刻的能力。