6-(Ethenyloxy)-1,1,1,2,2,3,3,4,4-nonafluorohexane | 63391-84-4

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 6-(Ethenyloxy)-1,1,1,2,2,3,3,4,4-nonafluorohexane
• 英文别名: 6-ethenoxy-1,1,1,2,2,3,3,4,4-nonafluorohexane
• CAS: 63391-84-4
• 化学式: C₈H₇F₉O
• 分子量: 290.13
• InChiKey: LAFIDLOOPJPAPN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  18
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  10

文献信息

• AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY
  申请人：DiPietro Richard Anthony

  公开号：US20080174051A1

  公开（公告）日：2008-07-24

  A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding layer filling voids in the relief pattern, the template not contacting the substrate; exposing the molding layer to actinic radiation, the actinic radiation converting the molding layer to a cured molding layer having thick and thin regions corresponding to the relief pattern; removing the template; filling the thin regions of the relief pattern with a backfill material; removing regions of the molding layer not protected by the backfill material to expose regions of the substrate; forming trenches in the exposed regions of the substrate; and removing any remaining molding layer and backfill material. A transfer layer may be used between the molding layer and the substrate.

  一种成型组合物和形成图案的方法。该方法包括在基板上形成芳香族二乙烯醚成型组合物的成型层；将具有凸起图案的模板压入成型层中，成型层填充凸起图案中的空隙，模板不接触基板；将成型层暴露于光致辐射下，光致辐射将成型层转化为具有厚和薄区域的固化成型层，与凸起图案相对应；移除模板；用回填材料填充凸起图案的薄区域；移除未被回填材料保护的成型层区域，以暴露基板区域；在暴露的基板区域中形成沟槽；并移除任何剩余的成型层和回填材料。成型层和基板之间可以使用转移层。
• Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
  申请人：JSR CORPORATION

  公开号：US10392699B2

  公开（公告）日：2019-08-27

  The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.

  本发明涉及：一种生产具有凹陷图案的结构的方法；一种树脂组合物；一种形成导电薄膜的方法；一种电子电路；以及一种电子设备。生产具有凹陷图案的结构的方法包括以下步骤(i)和(ii)，凹陷图案的薄膜厚度比步骤(i)中获得的涂膜薄 5%至小于 90%： (i) 使用树脂组合物在结构的非平面上形成涂膜的步骤，该树脂组合物包括含酸可分解基团的聚合物和酸生成物；以及 (ii) 通过对涂膜部分的规定部分进行辐射形成凹槽的步骤。
• DICHROIC DYE COMPOSITION
  申请人：Morishima Shinichi

  公开号：US20090274853A1

  公开（公告）日：2009-11-05

  A dichroic dye composition, containing at least one kind of azo dye represented by formula (I) that has a liquid crystallinity: wherein R 1 , R 2 , R 3 , R 4 , X 1 and X 2 each independently represent a hydrogen atom or a substituent; A 1 is a substituted or unsubstituted phenyl group, a substituted or unsubstituted naphthyl group, or a substituted or unsubstituted aromatic heterocyclic group; B 1 is a divalent substituted or unsubstituted aromatic hydrocarbon group or a divalent substituted or unsubstituted aromatic heterocyclic group; n represents an integer of 1 to 5; and at least one of B 1 s represents a phenylene group having an alkyl group.
• ACTINIC ENERGY RAY CURABLE RESION COMPOSITION AND USE THEREOF
  申请人：Kitano Takahiro

  公开号：US20090252932A1

  公开（公告）日：2009-10-08

  An active energy ray-curable resin composition is handleable when it is formed into an uncured film. The resin composition cures quickly, is formable, and can be used to make a hard coat layer with a high hardness. Specifically, the active energy ray-curable resin composition of the present invention contains a vinyl polymer having alkoxysilyl groups in its side chain, along with a photoacid generator. In its uncured state, the active energy ray-curable resin composition has a glass transition temperature of 15° C. to 100° C. 90 mass % or more of the Si-containing compound or Si-containing compound unit present in the active energy ray-curable resin composition is represented by the following structural formula 1: (R 1 ) n Si(OR 2 ) 4-n (Structural formula 1) wherein R 1 is a structural unit of the backbone of the vinyl polymer of the component (a), a residue bound to the backbone, a polymerizable group that can serve as the structural unit or the residues or a substituted or unsubstituted alkyl or aryl group; R 2 is an alkyl group having 1 to 5 carbon atoms; and n is an integer of 1 to 3.
• PATTERN FORMING PROCESS AND SHRINK AGENT
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160202612A1

  公开（公告）日：2016-07-14

  A negative pattern is formed by applying a resist composition onto a substrate, exposing the resist film, and developing the exposed resist film in an organic solvent developer. The process further involves coating the negative pattern with a shrink agent solution of a first polymer comprising recurring units capable of forming carboxyl, hydroxyl or lactone ring and a second polymer comprising recurring units capable of forming amino and fluorinated recurring units in an ester and/or ketone solvent, baking the coating, and removing the excessive shrink agent for thereby shrinking the size of spaces in the pattern.