6-nitronaphthalene-1-sulfonyl chloride | 848641-13-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 6-nitronaphthalene-1-sulfonyl chloride
• 英文别名: 6-nitro-naphthalene-1-sulfonyl chloride；6-Nitro-naphthalin-1-sulfonylchlorid
• CAS: 848641-13-4
• 化学式: C₁₀H₆ClNO₄S
• 分子量: 271.681
• InChiKey: KZCDCTGFKIDUAW-UHFFFAOYSA-N

物化性质

• 熔点：
  127 °C
• 沸点：
  428.5±20.0 °C(Predicted)
• 密度：
  1.579±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  17
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  88.3
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  6-nitronaphthalene-1-sulfonyl chloride 在 palladium on activated charcoal sodium hydroxide 、 氢气 、 碳酸氢钠 作用下， 以 甲醇 、 丙酮 为溶剂， 20.0 ℃ 、202.65 kPa 条件下， 反应 1.0h， 生成 (S)-2-(6-Amino-naphthalene-1-sulfonylamino)-3-[4-(5-dimethylamino-naphthalene-1-sulfonyloxy)-phenyl]-propionic acid
  参考文献：
  名称：

  Improving Specificity vs Bacterial Thymidylate Synthases through N-Dansyl Modulation of Didansyltyrosine

  摘要：

  N,O-Didansyl-L-tyrosine (DDT) represented the starting lead for further development of novel non-substrate-like inhibitors of bacterial thymidylate synthase. The N-dansyl structure modulation led to a submicromolar inhibitor of Lactobacillus casei TS (LcTS), which is highly specific with respect to human TS (hTS). Using molecular dynamics simulation, a binding mode for DDT vs LcTS was predicted, explaining activity and species-specificity along the series.

  DOI：

  10.1021/jm0491445
• 作为产物：
  描述：

  2-nitronaphthalene-5-sulfonic acid cha 在 五氯化磷 作用下， 以 四氯化碳 、 N,N-二甲基甲酰胺 为溶剂， 以38%的产率得到6-nitronaphthalene-1-sulfonyl chloride
  参考文献：
  名称：

  Improving Specificity vs Bacterial Thymidylate Synthases through N-Dansyl Modulation of Didansyltyrosine

  摘要：

  N,O-Didansyl-L-tyrosine (DDT) represented the starting lead for further development of novel non-substrate-like inhibitors of bacterial thymidylate synthase. The N-dansyl structure modulation led to a submicromolar inhibitor of Lactobacillus casei TS (LcTS), which is highly specific with respect to human TS (hTS). Using molecular dynamics simulation, a binding mode for DDT vs LcTS was predicted, explaining activity and species-specificity along the series.

  DOI：

  10.1021/jm0491445

文献信息

• POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3896521A1

  公开（公告）日：2021-10-20

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of -CO- and -SO2-; X1 is a tetravalent organic group; and 1 is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任何一种；X1 是四价有机基团；1 是 0 或 1；X2 是二价有机基团。
• Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component
  申请人：International Business Machines Corporation

  公开号：US11333975B2

  公开（公告）日：2022-05-17

  Provided is a polymer that can be used as a base resin for a positive photosensitive resin composition and a negative photosensitive resin composition, wherein the positive photosensitive resin composition and the negative photosensitive resin composition are soluble in an aqueous alkaline solution, can form a fine pattern, can achieve high resolution, and have good mechanical properties even when they are cured at low temperature. Also provided are a positive photosensitive resin composition and a negative photosensitive resin composition using the polymer. The polymer is represented by general formulas (1) and/or (2): wherein T1 and T2 may be the same as, or different from, each other and represent any of —CO— and —SO2—; X1 is a tetravalent organic group; and l is 0 or 1; and X2 is a divalent organic group.

  本发明提供了一种聚合物，可用作正感光树脂组合物和负感光树脂组合物的基础树脂，其中正感光树脂组合物和负感光树脂组合物可溶于碱性水溶液，可形成精细图案，可实现高分辨率，即使在低温下固化也具有良好的机械性能。此外，还提供了使用该聚合物的正感光树脂组合物和负感光树脂组合物。该聚合物由通式（1）和/或（2）表示： 其中 T1 和 T2 可以彼此相同或不同，并代表 -CO- 和 -SO2- 中的任意一种；X1 是四价有机基团；l 是 0 或 1；X2 是二价有机基团。
• Kappeler, Chemische Berichte, 1912, vol. 45, p. 634
  作者：Kappeler

  DOI：——

  日期：——