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N-(2-methylprop-2-enoyl)naphthalene-2-carboxamide | 1431733-96-8

中文名称
——
中文别名
——
英文名称
N-(2-methylprop-2-enoyl)naphthalene-2-carboxamide
英文别名
——
N-(2-methylprop-2-enoyl)naphthalene-2-carboxamide化学式
CAS
1431733-96-8
化学式
C15H13NO2
mdl
——
分子量
239.274
InChiKey
BGXHQSSKOSNHLY-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.8
  • 重原子数:
    18
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.07
  • 拓扑面积:
    46.2
  • 氢给体数:
    1
  • 氢受体数:
    2

文献信息

  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
    申请人:Tokyo Ohka Kogyo Co., Ltd.
    公开号:US20140221673A1
    公开(公告)日:2014-08-07
    A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R 1 represents a sulfur atom or an oxygen atom; R 2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.
    一种抗蚀组合物,包括基础组分(A),在酸的作用下在显影溶液中表现出改变的溶解性,以及在暴露后生成酸的酸发生器组分(B),基础组分(A)包含具有下述通用式(a5-0)所示的结构单元(a5)的聚合物化合物(A1)(R1代表原子或原子;R2代表单键或二价连接基团;Y代表芳香烃基团或具有多环基团的脂肪烃基团,前提是芳香烃基团或脂肪烃基团可以有其中的原子或原子被取代的取代基)。
  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20130157201A1
    公开(公告)日:2013-06-20
    A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below and a structural unit (a6) that generates acid upon exposure. In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R 1 represents a sulfur atom or an oxygen atom, R 2 represents a single bond or a divalent linking group, and Y represents a hydrocarbon group in which a carbon atom or a hydrogen atom may be substituted with a substituent.
  • US8778595B2
    申请人:——
    公开号:US8778595B2
    公开(公告)日:2014-07-15
  • US9133102B2
    申请人:——
    公开号:US9133102B2
    公开(公告)日:2015-09-15
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