Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.
根据本发明的实施例,提供了用于浸没光刻工艺的非自显影的去甲基
环戊烯型聚合物,制备这种聚合物的方法,使用这种聚合物的组合物以及利用这种组合物的浸没光刻工艺。更具体地,本发明的实施例涉及用于在浸没光刻工艺中形成覆盖光刻胶层的去甲基
环戊烯型聚合物,以及该过程。