4-(3-Phenylpropoxy)-phthalsaeure | 65687-30-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-(3-Phenylpropoxy)-phthalsaeure
• 英文别名: 4-(3-Phenylpropoxy)phthalic acid
• CAS: 65687-30-1
• 化学式: C₁₇H₁₆O₅
• 分子量: 300.311
• InChiKey: UWFBTSAGGCRMPJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  22
• 可旋转键数：
  7
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  83.8
• 氢给体数：
  2
• 氢受体数：
  5

文献信息

• [EN] HEAT SENSITIVE RECORDING MATERIAL<br/>[FR] MATERIAU D'ENREGISTREMENT THERMOSENSIBLE
  申请人：CIBA SC HOLDING AG

  公开号：WO2003101943A1

  公开（公告）日：2003-12-11

  New crystal forms of N-(p-toluenesulphonyl)-N'-(3-p-toluenesulphonyl-oxy-phenyl)urea, methods for its manufacture, its use, in particular for the manufacture of heat sensitive recording materials.

  新的晶体形态的N-(对甲苯磺酰基)-N'-(3-对甲苯磺酰氧基苯基)脲的制备方法及其用途，特别是用于制造热敏记录材料。
• Crystalline flouran compounds and their use in recording materials
  申请人：Ciba Specialty Chemicals Holding Inc.

  公开号：EP0928794A1

  公开（公告）日：1999-07-14

  Disclosed are a novel crystal form of the fluoran compound represented by formula (I) as characterised by specific X-ray powder diffraction pattern and melting range; process for the preparation of said novel crystal form and recording materials comprising the said crystal form.

  本发明公开了一种由式（I）代表的氟化合物的新型晶型，其特征在于特定的 X 射线粉末衍射图样和熔融范围；制备所述新型晶型的工艺以及包含所述晶型的记录材料。
• Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part
  申请人：Hitachi Chemical DuPont MicroSystems Ltd.

  公开号：EP1013650A2

  公开（公告）日：2000-06-28

  A 6,6'-dialkyl-3,3',4,4'-biphenyltetracarboxylic dianhydride is prepared by brominating a 4-alkylphthalic anhydride at its 5-position, and coupling the bromination product in the presence of a nickel catalyst; A photosensitive resin composition containing a polyimide precursor having repetitive units of general formula (7) is applied onto a substrate, exposed to i-line, developed and heated to form a polyimide relief pattern. wherein Y is a divalent organic group, R7 and R8 are OH or a monovalent organic group, R9 and R10 are a monovalent hydrocarbon group, R11, R12 and R13 are a monovalent hydrocarbon group, a and b are an integer of 0 to 2, c is an integer of 0 to 4, and m is an integer of 0 to 3.

  一种 6,6'-二烷基-3,3',4,4'-联苯四羧酸二酐是通过在其 5 位上溴化 4-烷基邻苯二甲酸酐，并在镍催化剂存在下偶联溴化产物而制备的；一种含有具有通式(7)重复单元的聚酰亚胺前体的光敏树脂组合物被涂覆在基底上，暴露于 i-线，显影并加热以形成聚酰亚胺浮雕图案。 其中 Y 是二价有机基团，R7 和 R8 是 OH 或一价有机基团，R9 和 R10 是一价烃基团，R11、R12 和 R13 是一价烃基团，a 和 b 是 0 至 2 的整数，c 是 0 至 4 的整数，m 是 0 至 3 的整数。
• HEAT SENSITIVE RECORDING MATERIAL AND COLOR DEVELOPER
  申请人：BASF SE

  公开号：EP3533619A1

  公开（公告）日：2019-09-04

  The present invention relates to a heat sensitive recording material, a novel compound, a process for its manufactures, and the use of a novel compound as color developer.

  本发明涉及一种热敏记录材料、一种新型化合物、其制造工艺以及使用新型化合物作为显色剂。
• HEAT SENSITIVE RECORDING MATERIAL
  申请人：Ciba Specialty Chemicals Holding Inc.

  公开号：EP1140515B1

  公开（公告）日：2004-09-15