9,9'-butanediyl-bis-fluoren-9-ol | 858799-84-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: 9,9'-butanediyl-bis-fluoren-9-ol
• 英文别名: 1.4-Bis-(9-hydroxy-fluorenyl-(9))-butan；9,9'-Butandiyl-bis-fluoren-9-ol；9-[4-(9-Hydroxyfluoren-9-yl)butyl]fluoren-9-ol
• CAS: 858799-84-5
• 化学式: C₃₀H₂₆O₂
• 分子量: 418.535
• InChiKey: NWDCLKLNQJWVDX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.7
• 重原子数：
  32
• 可旋转键数：
  5
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.2
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  9,9'-butanediyl-bis-fluoren-9-ol 在 盐酸 、 乙醚 、 sodium 作用下， 生成 1,4-bis-(9-benzyl-fluoren-9-yl)-butane
  参考文献：
  名称：

  THE ADDITION OF GRIGNARD REAGENTS TO THE DIBIPHENYLENEPOLYENES

  摘要：

  DOI：

  10.1021/jo01141a004
• 作为产物：
  描述：

  9-芴酮 、 alkaline earth salt of/the/ methylsulfuric acid 在 乙醚 作用下， 生成 9,9'-butanediyl-bis-fluoren-9-ol
  参考文献：
  名称：

  Schmitt, Justus Liebigs Annalen der Chemie, 1941, vol. 547, p. 103,113

  摘要：

  DOI：

文献信息

• Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10007183B2

  公开（公告）日：2018-06-26

  The invention provides a compound for forming an organic film having a partial structure represented by the following formula (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.

  本发明提供了一种用于形成有机薄膜的化合物，其部分结构由下式(ii)表示、 其中，环结构 Ar1、Ar2 和 Ar3 分别代表取代或未取代的苯环或萘环；e 为 0 或 1；R0 代表氢原子或具有 1 至 30 个碳原子的线性、支链或环状一价有机基团；L0 代表具有 1 至 32 个碳原子的线性、支链或环状二价有机基团；构成 L0 的亚甲基可被氧原子或羰基取代。本发明可提供一种有机薄膜组合物，用于形成具有高抗干蚀刻性和高级填充/平面化特性的有机薄膜。
• COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160018735A1

  公开（公告）日：2016-01-21

  The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2), wherein R 1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R 1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L 7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L 8′ represents the partial structure represented by the following formula (i), 0≦o<1, 0
• US9261788B2
  申请人：——

  公开号：US9261788B2

  公开（公告）日：2016-02-16
• US9977330B2
  申请人：——

  公开号：US9977330B2

  公开（公告）日：2018-05-22