申请人:3M Innovative Properties Company
公开号:US20020055065A1
公开(公告)日:2002-05-09
The polymers of the present invention are characterized by having at least one pendent acetal or ketal functional group in which at least two substituents of the acetal/ketal carbon atom independently comprise at least one silicon atom. The compositions of the present invention are useful as positive working resist compositions, in particular as the top imaging layer in a bilayer resist scheme for use in the manufacture of integrated circuits.
本发明的聚合物的特征在于至少具有一个侧链缩醛或缩酮官能团,其中缩醛/缩酮碳原子的至少两个取代基独立地包含至少一个硅原子。本发明的组合物可用作正向光刻胶组合物,特别是用于集成电路制造中双层光刻胶方案的顶层显影层。