ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
申请人:Iizuka Yusuke
公开号:US20130130178A1
公开(公告)日:2013-05-23
Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formulae (I-1) and (I-2) below:
Wherein each of R
1
s independently represents a hydrogen atom, an alkyl group or a halogen atom, X
1
represents a bivalent organic group, X
2
represents a single bond or a bivalent organic group, each of Ar
1
s independently represents a monovalent aromatic ring group, Ar
2
represents a bivalent aromatic ring group, and each of L's independently represents a single bond or a bivalent organic group.