1-(4-Cyclohexylphenyl)-1,1,2,2-tetraoxo-2-phenyl-1lambda~6~,2lambda~6~-disulfane | 426832-92-0

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-(4-Cyclohexylphenyl)-1,1,2,2-tetraoxo-2-phenyl-1lambda~6~,2lambda~6~-disulfane
• 英文别名: 1-(benzenesulfonylsulfonyl)-4-cyclohexylbenzene
• CAS: 426832-92-0
• 化学式: C₁₈H₂₀O₄S₂
• 分子量: 364.5
• InChiKey: VIKZIVDNFSAYBI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  24
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  85
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Positive photosensitive composition
  申请人：Kodama Kunihiko

  公开号：US20070003871A1

  公开（公告）日：2007-01-04

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

  一种正性光敏组合物包括一种化合物，该化合物能够在接受活性光线或辐射照射后产生一种指定的磺酸，并且（B）一种树脂，该树脂在酸作用下分解以增加在碱性显影剂中的溶解度。
• Negative-working resist composition
  申请人：FUJIFILM Corporation

  公开号：EP1117002B1

  公开（公告）日：2010-04-14
• Near Infrared Ray Activation Type Positive Resin Composition
  申请人：Imai Genji

  公开号：US20070259279A1

  公开（公告）日：2007-11-08

  A near infrared ray activation type positive resist composition comprising (A) a vinyl-based polymer having a monomer unit having an alkali-soluble group blocked by an ether having an alkenyl group next to an ether oxygen, (B) a photothermal converting substance generating heat by a light in the near infrared region, (C) a thermal acid generator generating an acid by heat, can provide a near infrared ray activation type positive resist composition which can be subjected to an exposure treatment in a complete bright room such as under a white light and the like, gives desired sensitivity and resolution, and of which baking treatment conditions can be relaxed or a baking treatment can be omitted, and a pattern formation method using the same.
• Positive resist composition for recording medium master, and method of producing recording medium master and method of producing stamper using the same
  申请人：Imai Genji

  公开号：US20090045552A1

  公开（公告）日：2009-02-19

  Provided are a positive resist composition for recording medium master showing excellent plating resistance and adhesion to a base plate such as glass or the like characterized by containing a vinyl polymer which has a monomer unit having an alkali-soluble group blocked by an alkyl vinyl ether, and a method of producing a recording medium master or stamper using this positive resist composition.
• POSITIVE PHOTOSENSITIVE COMPOSITION
  申请人：Kodama Kunihiko

  公开号：US20090148791A1

  公开（公告）日：2009-06-11

  A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.