1,4-bis(phenylsulfonyl diazomethylsulfonyl) butane | 251115-77-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,4-bis(phenylsulfonyl diazomethylsulfonyl) butane
• 英文别名: [(Z)-4-[(Z)-benzenesulfonyl(diazo)methyl]sulfonylbutylsulfonyl-diazomethyl]sulfonylbenzene
• CAS: 251115-77-2
• 化学式: C₁₈H₁₈N₄O₈S₄
• 分子量: 546.627
• InChiKey: JVUDAVZQVCLJKL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  34
• 可旋转键数：
  11
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  174
• 氢给体数：
  0
• 氢受体数：
  10

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：HADA Hideo

  公开号：US20120264061A1

  公开（公告）日：2012-10-18

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R 1 ″-R 3 ″ represents an aryl group or an alkyl group, provided that at least one of R 1 ″-R 3 ″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R 1 ″-R 3 ″ may be mutually bonded to form a ring with the sulfur atom; X represents a C 3 -C 30 hydrocarbon group; Q 1 represents a carbonyl group-containing divalent linking group; X 10 represents a C 1 -C 30 hydrocarbon group; Q 3 represents a single bond or a divalent linking group; Y 10 represents —C(═O)— or —SO 2 —; Y 11 represents a C 1 -C 10 alkyl group or a fluorinated alkyl group: Q 2 represents a single bond or an alkylene group; and W represents a C 2 -C 10 alkylene group).

  一种抗蚀组合物，包括在酸和酸发生剂组分（B）的作用下，在碱性显影溶液中表现出改变溶解性的基础组分（A），所述酸发生剂组分（B）包括由（b1-1）表示的化合物，由（b1-1'）表示的化合物和/或由（b1-1''）表示的化合物（R1''-R3''表示芳基或烷基，但至少其中一个R1''-R3''表示被(b1-1-0)表示的基团取代的取代芳基，且其中两个R1''-R3''可以相互键合以形成与硫原子形成环的环；X表示C3-C30烃基；Q1表示含有羰基的二价连接基团；X10表示C1-C30烃基；Q3表示单键或二价连接基团；Y10表示—C(═O)—或—SO2—；Y11表示C1-C10烷基或氟代烷基；Q2表示单键或烷基基团；W表示C2-C10烷基基团。
• NOVEL COMPOUND
  申请人：UTSUMI Yoshiyuki

  公开号：US20120149916A1

  公开（公告）日：2012-06-14

  A compound represented by general formula (c1) (R 1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M + represents an organic cation or a metal cation).

  一个由一般公式表示的化合物（c1）（R1代表一个含有5个或更多碳原子的脂环基团，可能带有取代基; X代表双价连接基团; Y代表线性、支链或环烷基团或芳基团; Rf代表含有氟原子的烃基团; M+代表有机阳离子或金属阳离子）。
• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：Kawaue Akiya

  公开号：US20100136478A1

  公开（公告）日：2010-06-03

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).

  一种抗蚀组合物，包括在酸发生剂的作用下在碱性显影溶液中表现出改变溶解度的基础组分（A）和在暴露后产生酸的酸发生剂组分（B），酸发生剂组分（B）包括含有由通式（I）表示的阳离子基团的化合物的酸发生剂（B1）（在该式中，R5代表具有羰基、酯键或磺酰基的有机基团；Q代表二价连接基团）。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140221673A1

  公开（公告）日：2014-08-07

  A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R 1 represents a sulfur atom or an oxygen atom; R 2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.

  一种抗蚀组合物，包括基础组分（A），在酸的作用下在显影溶液中表现出改变的溶解性，以及在暴露后生成酸的酸发生器组分（B），基础组分（A）包含具有下述通用式（a5-0）所示的结构单元（a5）的聚合物化合物（A1）（R1代表硫原子或氧原子；R2代表单键或二价连接基团；Y代表芳香烃基团或具有多环基团的脂肪烃基团，前提是芳香烃基团或脂肪烃基团可以有其中的碳原子或氢原子被取代的取代基）。
• Resist composition, method of forming resist pattern, novel compound and acid generator
  申请人：Kawaue Akiya

  公开号：US20100196820A1

  公开（公告）日：2010-08-05

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R 5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q 5 represents a single bond or a divalent linking group).

  一种抗蚀组合物，包括在酸处理下在碱性显影溶液中表现出溶解性变化的基础组分（A）和在暴露后生成酸的酸生成组分（B），酸生成组分（B）包括含有由通式（I）表示的阳离子基团的酸生成剂（B1）（在该式中，R5代表氢原子或具有1至30个碳原子的有可能具有取代基的有机基团；Q5代表单键或二价连接基团）。