sodium 3-((4-((12-(methacryloyloxy)dodecyloxy)carbonyl)phenoxy)sulfonyl)-1,1,2,2,3,3-hexafluoropropane-1-sulfonate | 1134354-57-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: sodium 3-((4-((12-(methacryloyloxy)dodecyloxy)carbonyl)phenoxy)sulfonyl)-1,1,2,2,3,3-hexafluoropropane-1-sulfonate
• 英文别名: Sodium;1,1,2,2,3,3-hexafluoro-3-[4-[12-(2-methylprop-2-enoyloxy)dodecoxycarbonyl]phenoxy]sulfonylpropane-1-sulfonate
• CAS: 1134354-57-6
• 化学式: C₂₆H₃₃F₆O₁₀S₂*Na
• 分子量: 706.654
• InChiKey: GTLUKWOXQCBLRS-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  2.94
• 重原子数：
  45
• 可旋转键数：
  23
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  170
• 氢给体数：
  0
• 氢受体数：
  16

文献信息

• PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION AND COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Wada Kenji

  公开号：US20100233617A1

  公开（公告）日：2010-09-16

  A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R   (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  一种感光组合物包括：（A）含有与下式（I）所表示的化合物对应的重复单元的树脂；该树脂能够在受到光敏射线或辐射照射后产生酸基团：Z-A-X—B—R   （I）其中Z代表一个能够在受到光敏射线或辐射照射后由阳离子离去而形成酸基团的基团；A代表一个烷基基团；X代表一个单键或含杂原子的二价连接基团；B代表一个单键、一个氧原子或—N（Rx）-；Rx代表一个氢原子或一个一价有机基团；R代表一个通过Y取代的一价有机基团；当B代表—N（Rx）-时，R和Rx可以结合在一起形成一个环；Y代表一个可聚合的基团。
• PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION, AND COMPOUND USED IN THE PHOTOSENSITIVE COMPOSITION
  申请人：Fujifilm Corporation

  公开号：EP2192134A1

  公开（公告）日：2010-06-02

  A photosensitive composition ensuring good performance in terms of pattern profile and line edge roughness in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the photosensitive composition, and a compound for use in the photosensitive composition are provided. A photosensitive composition comprising: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X-B-R wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or -N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents -N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  本发明提供了一种在正常曝光（干法曝光）、浸泡曝光和双重曝光中均能确保图案轮廓和线边粗糙度性能良好的感光组合物，一种使用该感光组合物的图案形成方法，以及一种用于该感光组合物的化合物。 一种光敏组合物，包括：(A) 一种树脂，其中含有与下式（I）所代表的化合物相对应的重复单元；该树脂在接受辐照时能产生酸基：Z-A-X-B-R 其中，Z 代表能成为酸性基团的基团，该酸性基团是阳离子在接受放 射线或辐射照射时离开阳离子而形成的；A 代表亚烷基；X 代表单键或含杂原子的二价连接基团；B代表单键、氧原子或-N(Rx)-；Rx代表氢原子或一价有机基团；R代表被Y取代的一价有机基团；当B代表-N(Rx)-时，R和Rx可相互结合形成环；Y代表可聚合基团。
• Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
  申请人：Fujifilm Corporation

  公开号：EP2426154A1

  公开（公告）日：2012-03-07

  A photosensitive composition ensuring good performance in terms of pattern profile and line edge roughness in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the photosensitive composition, and a compound for use in the photosensitive composition are provided. A photosensitive composition comprising: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation:         Z-A-X-B-R     (I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation which is a salt of an organic acid group selected from the group consisting of an imide acid group and a methide acid group; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or -N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents -N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.

  本发明提供了一种在正常曝光（干法曝光）、浸入式曝光和双重曝光中都能确保图案轮廓和线边粗糙度性能良好的感光组合物，一种使用该感光组合物的图案形成方法，以及一种用于该感光组合物的化合物。 一种光敏组合物包括：(A) 一种树脂，其中含有与下式 (I) 所代表的化合物相对应的重复单元；该树脂在接受放 射线或辐射照射时能够产生酸基： Z-A-X-B-R (I) 其中 Z 代表一个基团，该基团能在放 射线或辐射照射时因阳离子的离开而成为酸基，该阳离子是选自亚胺酸基和甲酰胺酸基的有机酸基的盐；A 代表一个亚烷基；X 代表单键或含杂原子的二价连接基团； B 代表单键、氧原子或-N(Rx)-； Rx 代表氢原子或一价有机基团； R 代表被 Y 取代的一价有机基团；当 B 代表-N(Rx)-时，R 和 Rx 可相互结合形成环；以及 Y 代表可聚合基团。
• US9051403B2
  申请人：——

  公开号：US9051403B2

  公开（公告）日：2015-06-09