4,4'-[1,4-Phenylenebis(carbonyloxybutane-4,1-diyloxycarbonyl)]dibenzoic acid | 66885-76-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4,4'-[1,4-Phenylenebis(carbonyloxybutane-4,1-diyloxycarbonyl)]dibenzoic acid
• 英文别名: 4-[4-[4-[4-(4-carboxybenzoyl)oxybutoxycarbonyl]benzoyl]oxybutoxycarbonyl]benzoic acid
• CAS: 66885-76-5
• 化学式: C₃₂H₃₀O₁₂
• 分子量: 606.6
• InChiKey: BHMFRRBMONBZNQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  44
• 可旋转键数：
  20
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  180
• 氢给体数：
  2
• 氢受体数：
  12

文献信息

• Organosilicone compositions and methods for preparing them
  申请人：Nesakumar Joseph Edward

  公开号：US20080255318A1

  公开（公告）日：2008-10-16

  Disclosed herein is a composition comprising a structure (M 1 ) a (M E ) b )D 1 ) c (D 2 ) d (T) e (Q) f , wherein M 1 =R 1 R 2 R 3 SiO 1/2 ; M E =R 4 R 5 R E SiO 1/2 ; D 1 =R 6 R 7 SiO 2/2 ; D 2 =R 8 R 9 SiO 2/2 ; T=R 10 SiO 3/2 ; and Q=SiO 4/2 ; wherein each R E is independently a monovalent hydrocarbon radical containing an epoxy group; R 9 comprises a structure -L 1 -Si(R 11 ) g (OR 12 ) 3-g or L 2 (D 3 ) h (M 2 ) i -L 3 -Si(R 13 ) g′ (OR 14 ) 3-g′ , wherein L 1 , L 2 , and L 3 are independently divalent linking groups; g and g′ independently have a value from 0 to 2; M 2 =R 15 R 16 R 17 SiO 1/2 ; D 3 =R 18 R 19 SiO 2/2 ; wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , and R 19 are independently monovalent hydrocarbon radicals; wherein a, b, c, d, e, f, h, and i are stoichiometric subscripts that are zero or positive subject to the following limitations: b has a value of 2; d is greater than or equal to 1; when (a+c+e+f) is equal to zero, (b+d) is greater than or equal to 3; and when i=0, h is at least 1.
• Organosilicone Compositions and Methods for Preparing Them
  申请人：Nesakumar Joseph Edward

  公开号：US20100249358A1

  公开（公告）日：2010-09-30

  Disclosed herein is a composition comprising a structure (M 1 ) a (M E ) b (D 1 ) c (D 2 ) d (T) e (Q) f , wherein M 1 =R 1 R 2 R 3 SiO 1/2 ; M E =R 4 R 5 R E SiO 1/2 ; D 1 =R 6 R 7 SiO 2/2 ; D 2 =R 8 R 9 SiO 2/2 ; T=R 10 SiO 3/2 ; and Q=SiO 4/2 ; wherein each R E is independently a monovalent hydrocarbon radical containing an epoxy group; R 9 comprises a structure -L 1 -Si(R 11 ) g (OR 12 ) 3-g or L 2 (D 3 ) h (M 2 ) i -L 3 -Si(R 13 ) g′ (OR 14 ) 3-g′ , wherein L 1 , L 2 , and L 3 are independently divalent linking groups; g and g′ independently have a value from 0 to 2; M 2 =R 15 R 16 R 17 SiO 1/2 ; D 3 =R 18 R 19 SiO 2/2 ; wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 17 , R 18 , and R 19 are independently monovalent hydrocarbon radicals; wherein a, b, c, d, e, f, h, and i are stoichiometric subscripts that are zero or positive subject to the following limitations: b has a value of 2; d is greater than or equal to 1; when (a+c+e+f) is equal to zero, (b+d) is greater than or equal to 3; and when i=0, h is at least 1.
• US7902314B2
  申请人：——

  公开号：US7902314B2

  公开（公告）日：2011-03-08