Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.
用于深紫外光刻的抗反射涂层材料包括一种或多种有机光吸收化合物,这些化合物与旋涂
玻璃材料结合在一起。合适的吸收化合物在波长范围内具有很强的吸收能力,例如可用于光刻技术的 365 纳米、248 纳米和 193 纳米。制造吸收性旋涂
玻璃材料的方法包括在合成旋涂
玻璃材料的过程中将一种或多种有机吸收化合物与烷氧基
硅烷或卤代
硅烷反应物结合。