申请人:Ito Satoshi
公开号:US20110137024A1
公开(公告)日:2011-06-09
Disclosed is a method for manufacturing isoindolic compound, which can adopt a condition capable of being put to industrially practical use, which can produce stable isoindolic compound, and which can further produce the isoindolic compound with a high yield. The method for manufacturing isoindolic compound comprises a thermal treatment step where a compound of which molecule includes a structure of pyrrole fused with bicyclo [2.2.2] octadiene skeleton is subjected to a supercritical carbon dioxide atmosphere. The thermal treatment step is preferably performed at a temperature of not less than 50° C. and not more than 300° C.