ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
申请人:TAKAHASHI Hidenori
公开号:US20110318693A1
公开(公告)日:2011-12-29
An embodiment of the composition contains a resin (P) containing a repeating unit (A) that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid. The repeating unit (A) contains a cation structure with a monocyclic or polycyclic heterocycle containing a nitrogen atom.
该组合物的实施例包含一种树脂(P),其中包含一个重复单元(A),当暴露于光致射线或辐射时,该单元(A)被配置为分解以产生酸。 重复单元(A)包含具有含氮杂环的单环或多环阳离子结构。