Acetic acid--2-ethenylphenol (1/1) | 59858-52-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Acetic acid--2-ethenylphenol (1/1)
• 英文别名: acetic acid;2-ethenylphenol
• CAS: 59858-52-5
• 化学式: C10H12O3
• 分子量: 180.2
• InChiKey: BKOWBAOXCAZKSB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.13
• 重原子数：
  13
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.1
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• Adsorbent and Analysis Method Using Same
  申请人：HITACHI HIGH-TECHNOLOGIES CORPORATION

  公开号：US20160109417A1

  公开（公告）日：2016-04-21

  An adsorbent which enables solid phase extraction of water-soluble molecules with high efficiency and excellent selectivity and an analysis system using the adsorbent, the adsorbent containing a structure represented by the formula I wherein R is a carrier component, the moiety other than R is a side-chain functional group, R and the benzene ring in the side-chain functional group are bonded directly or bonded through one or more atoms, R′ is selected from the group consisting of hydroxy group, alkoxy group, amino group, alkylamino group, thiol group and alkyl sulfide group, R″ is independently selected from the group consisting of hydroxy group, alkoxy group, alkyl group, amino group, alkylamino group, dialkylamino group, trialkylamino group, thiol group, alkyl sulfide group and hydrogen atom, x is an integer of zero or more and three or less, and n is the number of the side-chain functional groups contained in the carrier component.

  一种吸附剂，能够高效、选择性地固相萃取水溶性分子，并使用该吸附剂的分析系统，该吸附剂包含由式I表示的结构，其中R是载体组分，除R外的部分是侧链功能基，R和侧链功能基中的苯环直接键合或通过一个或多个原子键合，R′选自羟基、烷氧基、氨基、烷基氨基、硫醇基和烷基硫醚基的群组，R″独立地选自羟基、烷氧基、烷基、氨基、烷基氨基、二烷基氨基、三烷基氨基、硫醇基、烷基硫醚基和氢原子的群组，x为零或更多且不超过三的整数，n为载体组分中含有的侧链功能基数。
• Adsorbent and analysis method using same
  申请人：Hitachi High-Technologies Corporation

  公开号：US10024828B2

  公开（公告）日：2018-07-17

  An adsorbent which enables solid phase extraction of water-soluble molecules with high efficiency and excellent selectivity and an analysis system using the adsorbent, the adsorbent containing a structure represented by the formula I wherein R is a carrier component, the moiety other than R is a side-chain functional group, R and the benzene ring in the side-chain functional group are bonded directly or bonded through one or more atoms, R′ is selected from the group consisting of hydroxy group, alkoxy group, amino group, alkylamino group, thiol group and alkyl sulfide group, R″ is independently selected from the group consisting of hydroxy group, alkoxy group, alkyl group, amino group, alkylamino group, dialkylamino group, trialkylamino group, thiol group, alkyl sulfide group and hydrogen atom, x is an integer of zero or more and three or less, and n is the number of the side-chain functional groups contained in the carrier component.

  一种能以高效率和优异的选择性固相萃取水溶性分子的吸附剂和一种使用该吸附剂的分析系统，该吸附剂含有由式 I 表示的结构 其中 R 是载体组分，R 以外的分子是侧链官能团，R 和侧链官能团中的苯环直接键合或通过一个或多个原子键合，R′选自羟基、烷氧基、氨基、烷基氨基、硫醇基和烷基硫醚基组成的组、R″独立地选自由羟基、烷氧基、烷基、氨基、烷基氨基、二烷基氨基、三烷基氨基、硫醇基、硫化烷基和氢原子组成的组，x 为 0 或 0 以上 3 或 3 以下的整数，n 为载体组分中所含侧链官能团的数目。
• [EN] METAL ION REDUCTION IN POLYHYDROXYSTYRENE AND PHOTORESISTS<br/>[FR] REDUCTION DE LA TENEUR EN IONS METALLIQUES DANS LE POLYHYDROXYSTYRENE ET LES PHOTORESISTS
  申请人：HOECHST CELANESE CORPORATION

  公开号：WO1994014858A1

  公开（公告）日：1994-07-07

  (EN) The present invention provides methods for producing water insoluble, aqueous alkali soluble polyhydroxystyrene having a very low level of chloride and metal ions, utilizing treated anionic and acidic ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such polyhydroxystyrene and for producing semiconductor devices using such photoresist compositions.(FR) L'invention concerne des procédés de production de polyhydroxystyrène aqueux soluble dans l'alcali et insoluble dans l'eau présentant une très faible teneur en chlorure et ions métalliques, à l'aide de résines échangeuses d'ions traitées anioniques et acides. L'invention se rapporte également à un procédé de production d'une composition à photorésist à très faible teneur en ions métalliques à partir dudit polyhydroxystyrène et à un procédé de production de dispositifs à semiconducteurs à l'aide desdites compositions à photorésist.