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2-(4-hydroxyphenyl)-2-(3-cyclohexyl-4-hydroxyphenyl)propane | 83310-48-9

中文名称
——
中文别名
——
英文名称
2-(4-hydroxyphenyl)-2-(3-cyclohexyl-4-hydroxyphenyl)propane
英文别名
2-Cyclohexyl-4-[2-(4-hydroxyphenyl)propan-2-yl]phenol
2-(4-hydroxyphenyl)-2-(3-cyclohexyl-4-hydroxyphenyl)propane化学式
CAS
83310-48-9
化学式
C21H26O2
mdl
——
分子量
310.436
InChiKey
ZJUBMERVMHAVPN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    6.5
  • 重原子数:
    23
  • 可旋转键数:
    3
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.43
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

文献信息

  • Optically active compound and photosensitive resin composition
    申请人:——
    公开号:US20030211421A1
    公开(公告)日:2003-11-13
    A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
    一种光活性化合物与光敏剂结合使用,由以下公式(1)表示: A −[( J ) m −( X-Pro )] n (1) 其中,A代表至少包括一种从烃基和杂环基中选择的疏基的疏单元,J代表连接基团,X-Pro代表由光照可去除的保护基团Pro保护的亲基团,m代表0或1,n代表不少于1的整数。 保护基团Pro可以与光敏剂(特别是光酸发生剂)一起通过光照可去除,也可以是疏保护基团。亲基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性,用于光刻应用,因此,该光活性化合物有利于形成具有高分辨率的图案。
  • POLYCARBONATE RESIN COMPOSITION AND FORMED PRODUCT THEREOF
    申请人:Monden Toshiki
    公开号:US20110245388A1
    公开(公告)日:2011-10-06
    In a polycarbonate resin composition containing a polycarbonate resin and a polycarbosilane compound, the use of the polycarbosilane compound modifies the surface properties of the polycarbonate resin composition without adversely affecting the intrinsic characteristics of the polycarbonate resin, such as transparency, heat resistance, and mechanical properties, e.g., impact resistance. A polycarbonate resin composition containing 100 parts by mass of a polycarbonate resin, 0.001 to 1 part by mass of a metal salt compound, and 0.005 to 5 parts by mass of a polycarbosilane compound has significantly improved flame resistance and high transparency and causes markedly reduced outgassing and mold fouling, without losing impact resistance and heat resistance.
    在含有聚碳酸树脂和聚碳硅烷化合物的聚碳酸树脂组合物中,使用聚碳硅烷化合物可以改变聚碳酸树脂组合物的表面特性,而不会对聚碳酸树脂的固有特性产生不利影响,如透明度、耐热性和机械性能(例如冲击强度)。含有100质量部聚碳酸树脂、0.001至1质量部属盐化合物和0.005至5质量部聚碳硅烷化合物的聚碳酸树脂组合物具有显著提高的阻燃性和高透明度,显著减少气体排放和模具污染,同时不会损失冲击强度和耐热性。
  • POLYHYDRIC PHENOL COMPOUND AND METHOD OF PRODUCING SAME
    申请人:MITSUBISHI CHEMICAL CORPORATION
    公开号:US20190210947A1
    公开(公告)日:2019-07-11
    The present invention provides a polyhydric phenol compound which has an excellent alkali resistance and which does not cause a deterioration in color even when used as a resin raw material or a color developer. The polyhydric phenol compound includes: a bisphenol compound (A) represented by the following Formula (1) and a trisphenol compound (B) represented by the following Formula (2): [wherein R 1 represents a monovalent aliphatic hydrocarbon group having from 6 to 24 carbon atoms; each of R 2 , R 3 , R 4 , R 5 and R 6 represents a monovalent hydrocarbon group having from 1 to 15 carbon atoms; and each of a, b, c, d and e represents an integer from 0 to 4]; wherein the trisphenol compound (B) is contained in an amount, in terms of absorption intensity ratio at 254 nm, of less than 1.6% by area with respect to the amount of the bisphenol compound (A).
    本发明提供了一种聚羟基化合物,具有优异的耐碱性能,并且即使用作树脂原料或颜料开发剂也不会导致颜色恶化。该聚羟基化合物包括:由以下公式(1)表示的双化合物(A)和由以下公式(2)表示的三化合物(B):[其中R1表示具有6至24个碳原子的单价脂肪烃基;R2、R3、R4、R5和R6中的每一个表示具有1至15个碳原子的单价烃基;a、b、c、d和e中的每一个表示0至4的整数];其中,以吸收强度比值(在254 nm处)计算,三化合物(B)的含量在面积上小于双化合物(A)的含量的1.6%。
  • OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
    申请人:Kansai Research Institute, Inc.
    公开号:EP1375463A1
    公开(公告)日:2004-01-02
    A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
    光活性化合物与光敏剂结合使用,光敏剂由下式(1)表示: A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏单元,包括至少一种选自烃基和杂环基的疏基团;J 代表连接基团;X-Pro 代表亲基团,该亲基团受保护基团 Pro 的保护,该保护基团可通过光照去除;m 代表 0 或 1;n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂(特别是光酸发生器)一起进行光照射而去除,也可以是疏保护基。亲基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度,因此在抗蚀剂应用中,光活性化合物可用于形成具有高分辨率的图案。
  • Polycarbonate resin composition and formed product thereof
    申请人:Mitsubishi Engineering- Plastics Corporation
    公开号:EP2570458A1
    公开(公告)日:2013-03-20
    The present invention is directed to a polycarbonate resin composition comprising 0.01 to 1 part by mass of a metal salt compound and 0.01 to 5 parts by mass of a polysilane relative to 100 parts by mass of a polycarbonate resin, wherein the metal salt compound is an organic sulfonic acid alkali metal salt, and wherein the organic sulfonic acid alkali metal salt is at least one selected from a fluorine-containing aliphatic sulfonic acid alkali metal salt and an aromatic sulfonic acid alkali metal salt.
    本发明涉及一种聚碳酸树脂组合物,相对于 100 重量份的聚碳酸树脂,该组合物包含 0.01 至 1 重量份的属盐化合物和 0.01 至 5 重量份的聚硅烷,其中属盐化合物为有机磺酸属盐,而有机磺酸属盐至少选自含脂肪族磺酸属盐和芳香族磺酸属盐中的一种。
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