N-p-Tosyl-N-benzolsulfonyl-n-propylamin | 54563-77-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-p-Tosyl-N-benzolsulfonyl-n-propylamin
• 英文别名: N-(benzenesulfonyl)-4-methyl-N-propylbenzenesulfonamide
• CAS: 54563-77-8
• 化学式: C₁₆H₁₉NO₄S₂
• 分子量: 353.463
• InChiKey: JLDPZGLXQKYTKS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  23
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  88.3
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• COMPOUND, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM USING SAME, RESIST-COATED MASK BLANK, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20160116840A1

  公开（公告）日：2016-04-28

  Provided is an active light sensitive or radiation sensitive resin composition which contains a compound (A) represented by General Formula (I) or (II): in the formulae, each of Y 1 and Y 2 represents a monovalent organic group; each of M 1 + and M 2 + represents an organic onium ion; each of X 1 and X 2 represents a group that is represented by —S—, —NH—, or —NR 1 —; R 1 represents a monovalent organic group; each of n1 and n2 represents an integer of 1 or more; and R 1 and Y 1 or Y 2 may bond with each other to form a ring.
• US9904167B2
  申请人：——

  公开号：US9904167B2

  公开（公告）日：2018-02-27