(1,3-Dioxolan-4-yl)methyl methacrylate | 10525-59-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二氧戊环
• 英文名称: (1,3-Dioxolan-4-yl)methyl methacrylate
• 英文别名: 1,3-dioxolan-4-ylmethyl 2-methylprop-2-enoate
• CAS: 10525-59-4
• 化学式: C₈H₁₂O₄
• 分子量: 172.18
• InChiKey: GJGBXCGXKNONJU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  12
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  44.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20170115566A1

  公开（公告）日：2017-04-27

  A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of α-fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.

  一种抗蚀组合物包括基树脂，其中包含含酸敏感基团的重复单元，最好包含含酸发生剂的重复单元，以及与烷基、烯基、炔基或芳基结合的α-氟磺酸的钠、镁、钾、钙、铷、锶、钇、铯、钡或铈盐，表现出高分辨率和灵敏度，并在曝光和显影后形成具有最小LWR的满意轮廓图案。
• NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Sagehashi Masayoshi

  公开号：US20120183904A1

  公开（公告）日：2012-07-19

  A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.

  一种化学增感正向光阻组合物可以使用具有淬灭剂的聚合物制备，具体来说，该聚合物包含具有碳酸酯结构的重复单元，该碳酸酯结构在酸的作用下分解生成氨基团，并且可以包含具有酸敏感基团的重复单元，该酸敏感基团在酸的作用下能够生成羧基和/或羟基团。该聚合物对于抑制酸的扩散非常有效，并且本身扩散很少，组合物形成高分辨率的矩形剖面图案。
• RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130309606A1

  公开（公告）日：2013-11-21

  A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R 1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R 2 is H or CH 3 , and m is 1 to 4. The polymer is used as a base resin to formulate a resist composition, which is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.

  一种聚合物是通过共聚反应获得的，其中具有羧酸和/或酚羟基的重复单元被取代为酸易裂解基团，而具有公式（1）的重复单元的R1为甲基，乙基，丙基，甲氧基，乙氧基或丙氧基，R2为H或CH3，m为1到4。该聚合物用作基础树脂来制备抗蚀剂组合物，该组合物在曝光前后的碱溶解速率对比、酸扩散控制、分辨率以及曝光后图案的轮廓和边缘粗糙度方面得到改善。
• Resist composition and pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10012903B2

  公开（公告）日：2018-07-03

  A resist composition is provided comprising a polymer comprising recurring units (a) having a succinimide structure and recurring units (b) containing a group capable of polarity switch with the aid of acid. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.

  本发明提供了一种抗蚀剂组合物，其中包含一种聚合物，该聚合物由具有琥珀酰亚胺结构的递归单元（a）和含有可借助酸进行极性转换的基团的递归单元（b）组成。这种抗蚀剂组合物能抑制酸的扩散，具有高分辨率，并能形成边缘粗糙度低、轮廓令人满意的图案。
• Method for producing monomers from isomeric mixtures
  申请人：Evonik Operations GmbH

  公开号：US10676454B2

  公开（公告）日：2020-06-09

  A process produces a (meth)acrylate ester mixture. The process includes reacting a glycerol formal isomer mixture with an alkyl (meth)acrylate in the presence of a catalyst.

  一种生产（甲基）丙烯酸酯混合物的工艺。该工艺包括在催化剂存在下使甘油形式异构体混合物与（甲基）丙烯酸烷基酯反应。