Tris[2-(ethenyloxy)ethyl] benzene-1,3,5-tricarboxylate | 140220-84-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Tris[2-(ethenyloxy)ethyl] benzene-1,3,5-tricarboxylate
• 英文别名: tris(2-ethenoxyethyl) benzene-1,3,5-tricarboxylate
• CAS: 140220-84-4
• 化学式: C₂₁H₂₄O₉
• 分子量: 420.4
• InChiKey: WZWXVHFSGOFPHF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  30
• 可旋转键数：
  18
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  107
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• Process for preparing star compounds
  申请人：SEKISUI CHEMICAL CO., LTD.

  公开号：EP0464408A1

  公开（公告）日：1992-01-08

  A process for preparing a three-branched or four-branched star compound comprising polymerizing an olefin compound represented by the formula wherein A is a single bond or phenylene group, and R3 is a hydrogen atom or methyl group and R4 is a monovalent organic group when A is a single bond, or R3 is a hydrogen atom and R4 is an alkyl group when A is a phenylene group, using as an initiator the adduct of a polyfunctional alkenyl ether represented by the formula (I) wherein R1 is a hydrogen atom or methyl group, n is an integer of 3 or 4, and R2 is a trivalent organic group when n is 3 or a tetravelent organic group when n is 4 with a cation-donating compound.

  一种制备三支链或四支链星状化合物的工艺，包括聚合由式表示的烯烃化合物 其中 A 为单键或亚苯基，R3 为氢原子或甲基，当 A 为单键时，R4 为单价有机基团，或当 A 为亚苯基时，R3 为氢原子，R4 为烷基，以式(I)表示的多官能团烯基醚的加合物作为引发剂 其中 R1 是氢原子或甲基，n 是 3 或 4 的整数，当 n 为 3 时，R2 是三价有机基团，当 n 为 4 时，R2 是四价有机基团。
• Photoresist underlayer film-forming composition and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2813890A2

  公开（公告）日：2014-12-17

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a naphtholphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.

  在光刻技术中，使用由萘酚酞递归单元组成的酚醛树脂组合物来形成光刻胶底层膜。该底层膜可在碱水中剥离，不会对离子注入的硅基底或二氧化硅基底造成损坏。
• Underlayer film-forming composition and pattern forming process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US10228621B2

  公开（公告）日：2019-03-12

  In lithography, a composition comprising a novolak resin comprising recurring units derived from a phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, or Thymolphthalein is used to form a photoresist underlayer film. The underlayer film is strippable in alkaline water, without causing damage to ion-implanted Si substrates or SiO2 substrates.

  在光刻技术中，一种包含由酚酞、酚红、甲酚酞、甲酚红或百里酚酞递归单元组成的酚醛树脂的组合物用于形成光阻底层膜。底层膜可在碱水中剥离，不会对离子注入的硅基底或二氧化硅基底造成损坏。
• METHOD OF FORMING A MICROELECTRONIQUE STRUCTURE HAVING AN ANTI-REFLECTIVE COATING USING VINYL ETHER CROSSLINKERS
  申请人：Brewer Science, Inc.

  公开号：EP1743219B1

  公开（公告）日：2015-12-09
• METHOD OF FORMING A MICROELECTRONIC STRUCTURE
  申请人：Brewer Science, Inc.

  公开号：EP2207837B1

  公开（公告）日：2015-03-25