1,1,1,2,2,3,3,4,4,5-Decafluorohexane | 155072-58-5

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 1,1,1,2,2,3,3,4,4,5-Decafluorohexane
• CAS: 155072-58-5
• 化学式: C₆H₄F₁₀
• 分子量: 266.08
• InChiKey: VITJFJAWHDIGGH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  10

文献信息

• Azeotropic or azeotropic-like composition of hydrochlorofluoropropane
  申请人：ASAHI GLASS COMPANY LTD.

  公开号：EP0382095A1

  公开（公告）日：1990-08-16

  A hydrochlorofluoropropane azeotropic or azeotropic-­like composition comprising at least two members selected from the group consisting of hydrochlorofluoropropanes of the formula I: CHaClbFcCF₂CHxClyFz      (I) wherein a+b+c=3, x+y+z=3, a+x≧1, b+y≧1, and 0≦a,b,c,x,y,z≦3.

  一种氯氟丙烷共沸物或类共沸物组合物，包含至少两种选自由式 I 组成的氯氟丙烷： CHaClbFcCF₂CHxClyFz (I) 其中 a+b+c=3，x+y+z=3，a+x≧1，b+y≧1，0≦a,b,c,x,y,z≦3。
• WATER- AND OIL-REPELLENT COMPOSITION AND PROCESS FOR PRODUCING THE SAME
  申请人：DAIKIN INDUSTRIES, LIMITED

  公开号：EP0676458A1

  公开（公告）日：1995-10-11

  A process for producing a water- and oil-repellent composition which comprises conducting solution polymerization of a polymerizable monomer at least containing a polyfluoroalkylated monomer in a polymerization solvent containing at least 5 wt.% of at least one compound selected from the group consisting of C₂-C₃ hydrochlorofluorocarbons which boil at 0-150°C and C₄-C₆ hydrofluorocarbons having at least four fluorine atoms.

  一种生产憎水憎油组合物的工艺，包括在含有至少 5 重量百分比的至少一种选自以下组别的化合物的聚合溶剂中，对至少含有多氟烷基化单体的可聚合单体进行溶液聚合：在 0-150°C 下沸腾的 C₂-C₃ 氢氯氟碳化合物和至少有四个氟原子的 C₄-C₆ 氢氟碳化合物。
• Apparatuses for reducing metal residue in edge bead region from metal-containing resists
  申请人：Inpria Corporation

  公开号：US11187986B2

  公开（公告）日：2021-11-30

  Apparatuses and methods are described for removing edge bead on a wafer associated with a resist coating comprising a metal containing resist compositions. The methods can comprise applying a first bead edge rinse solution along a wafer edge following spin coating of the wafer with the metal based resist composition, wherein the edge bead solution comprises an organic solvent and an additive comprising a carboxylic acid, an inorganic fluorinated acid, a tetraalkylammonium compound, or a mixture thereof. Alternatively or additionally, the methods can comprise applying a protective composition to the wafer prior to performing an edge bead rinse. The protective composition can be a sacrificial material or an anti-adhesion material and can be applied only to the wafer edge or across the entire wafer in the case of the protective composition. Corresponding apparatuses for processing the wafers using these methods are presented.

  本文描述了用于去除晶圆上与含金属抗蚀剂组合物的抗蚀剂涂层相关的边缘微珠的装置和方法。这些方法可以包括在用金属基抗蚀剂组合物对晶片进行旋涂后，沿晶片边缘施加第一珠边冲洗溶液，其中珠边溶液包括有机溶剂和添加剂，添加剂包括羧酸、无机氟化酸、四烷基铵化合物或它们的混合物。另外，这些方法还包括在进行边缘微珠冲洗之前，在晶圆上涂抹保护组合物。保护性组合物可以是牺牲材料或抗粘连材料，在保护性组合物的情况下，可以只应用于晶圆边缘或整个晶圆。还介绍了使用这些方法处理晶片的相应装置。
• Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications
  申请人：Kyzen Corporation

  公开号：US20030083220A1

  公开（公告）日：2003-05-01

  Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of mono brominated compounds with highly fluorinated compounds and/or other agents that improve and enhance the properties of the original mixture. The addition of these agents to the composition will modify the physical and/or cleaning characteristics of the monobrominated compound and/or monobrominated compound-fluorinated compound mixture to accomplish is desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, terpenes, dibasic esters, glycol ethers, pyrollidones, or low or non ozone depleting chlorinated and chlorinated/fluorinated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, drycleaning, degreasing, particle removal, metal and textile cleaning.

  化学溶解剂、脱脂剂、剥离剂和清洁剂。这些制剂是单溴化合物与高氟化合物和/或其他制剂的清洁和溶解混合物，可改善和提高原始混合物的特性。在组合物中加入这些制剂，可改变单溴化合物和/或单溴化合物-氟化合物混合物的物理和/或清洁特性，以完成所需的清洁或溶解任务。这些其他制剂包括以下一种或多种材料：醇、酯、醚、环醚、酮、烷烃、萜烯、二元酯、乙二醇醚、吡咯烷酮，或低或不消耗臭氧的氯化和氯化/氟化碳氢化合物。这些混合物适用于各种溶解、蒸汽脱脂、光刻胶剥离、粘合剂去除、气溶胶、冷清洗和溶剂清洗应用，包括脱泡、干洗、脱脂、颗粒去除、金属和纺织品清洗。
• Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds
  申请人：Kyzen Corporation

  公开号：US20040224870A1

  公开（公告）日：2004-11-11

  Chemical solvating, degreasing, stripping and cleaning agents. The agents are cleaning and solvating mixtures of dichloroethylene and alkoxy-substituted perfluoro compounds that contain six carbon atoms, with optionally highly fluorinated materials to retard flammability and/or other enhancement agents that improve and enhance the properties of the composition to accomplish its desired cleaning or solvating task. These other agents are one or more of the following materials: alcohols, esters, ethers, cyclic ethers, ketones, alkanes, aromatics, amines, siloxanes terpenes, dibasic esters, glycol ethers, pyrollidones, or low- or non-ozone depleting halogenated hydrocarbons. These mixtures are useful in a variety of solvating, vapor degreasing, photoresist stripping, adhesive removal, aerosol, cold cleaning, and solvent cleaning applications including defluxing, dry-cleaning, degreasing, particle removal, metal and textile cleaning.

  化学溶解剂、脱脂剂、剥离剂和清洗剂。这些药剂是二氯乙烯和含有六个碳原子的烷氧基取代全氟化合物的清洁和溶解混合物，可选择使用高氟化材料来阻燃，和/或使用其他增强剂来改善和提高组合物的性能，以完成所需的清洁或溶解任务。这些增强剂包括以下一种或多种材料：醇、酯、醚、环醚、酮、烷烃、芳烃、胺、硅氧烷、萜烯、二元酯、乙二醇醚、吡咯烷酮或低或非臭氧消耗卤代烃。这些混合物适用于各种溶解、蒸汽脱脂、光刻胶剥离、粘合剂去除、气溶胶、冷清洗和溶剂清洗应用，包括脱泡、干洗、脱脂、颗粒去除、金属和纺织品清洗。