(1Z)-1-diazo-3-methyl-1-(4-methylphenyl)sulfonylbutan-2-one

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (1Z)-1-diazo-3-methyl-1-(4-methylphenyl)sulfonylbutan-2-one
• 化学式: C12H14N2O3S
• 分子量: 266.32
• InChiKey: BPDJYHYNEQRLLW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  61.6
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Pretreatment compositions
  申请人：Powell B. David

  公开号：US20060286484A1

  公开（公告）日：2006-12-21

  A pretreatment composition of: (a) at least one compound having structure VI V 1 —Y—V 2 VI wherein Y is selected from the group consisting of S, O, NR 2 , (HOCH) p , and each R 1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R 2 is independently H, SH, CH 3 , C 2 H 5 , and a linear or branched C 1 -C 4 alkyl group containing a thiol group; and wherein V 1 and V 2 are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can =0 only when Y═ n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R 1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.

  预处理组合物包括：(a)至少一种具有结构VIV1—Y—V2VI的化合物，其中Y选自S、O、NR2、(HOCH)p和each R1，每个R1独立选自H、烷基、烯基、炔基、烷氧基或卤素，每个R2独立为H、SH、CH3、C2H5和含巯基的直链或支链C1-C4烷基；其中V1和V2独立选自，其中m独立为0到4的整数，条件是m只能为0当Y=n为1到5的整数；p为1到4的整数，每个R1如上定义；(b)至少一种有机溶剂，以及可选地(c)至少一种促进粘附的物质；其中，组合物中存在的结构VI化合物的量足以抑制光敏组合物涂布在基材上并在涂覆的基材上形成图像时形成残留物。
• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• Photoacid generators for use in photoresist compositions
  申请人：ARCH SPECIALTY CHEMICALS, INC.

  公开号：US20020197558A1

  公开（公告）日：2002-12-26

  A photoacid compound having the following general structure: R—O(CF 2 ) n SO 3 X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C 1 -C 12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF 2 ) p O) m (CF 2 ) q — wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.

  具有以下一般结构的光酸化合物：R—O（CF2）nSO3X，其中n是介于1到4之间的整数；R选自以下组合：取代或未取代的C1-C12线性或支链烷基或烯基，取代或未取代的araalkyl，取代或未取代的芳基，取代或未取代的双环烷基，取代或未取代的三环烷基，氢，烷基磺酸，取代或未取代的部分氟化烷基，一般结构F（（CF2）pO）m（CF2）q—其中p介于1到4之间，m介于0到3之间，q介于1到4之间，以及取代或未取代的部分氟化烷基，卤氟烷基，全氟烷基磺酸或环氧丙基；X选自有机阳离子和共价键合有机基团的组合。
• Polymer for photoresist, method of production thereof and photoresist composition containing polymer
  申请人：——

  公开号：US20020015906A1

  公开（公告）日：2002-02-07

  A polymer for a photoresist composition is given by the formula (I): 1 wherein R 1 is a hydrogen atom or a methyl group, R 2 is a C 1-12 linear or branched alkyl, haloalkyl or alkoxycarbonyl group, a C 5-12 cyclic alkyl, cyclic haloalkyl or cyclic alkoxycarbonyl group, a phenyl group or a naphthyl group, R 3 is a C 1-12 linear or branched alkyl or haloalkyl group, a C 5-12 cyclic alkyl or cyclic haloalkyl group, a phenyl group, or a naphthyl group, R 4 and R 5 are independently a hydrogen atom, a C 1-6 linear or branched alkyl, or a C 5-6 cyclic alkyl group, R′ and R″ are independently a hydrogen atom, a halogen atom, a C 1-8 alkyl or alkoxy group, a hydroxy group, a carbonate group or a phenyl group, and m, n, p and q are independently an integer provided that m and q are not zero, at least one of n and p are not zero, 0.4≦m/(m+n+p+q)≦0.9, 0≦n/(m+n+p+q)≦0.5, 0≦p/(m+n+p+q)≦0.5, and 0.01≦q/(m+n+p+q)≦0.3.

  给出了一种用于光阻组合物的聚合物，其化学式为（I）：其中R1是氢原子或甲基基团，R2是C1-12线性或支链烷基，卤代烷基或烷氧羰基基团，C5-12环烷基，环卤代烷基或环烷氧羰基基团，苯基或萘基，R3是C1-12线性或支链烷基或卤代烷基，C5-12环烷基或环卤代烷基，苯基或萘基，R4和R5分别是氢原子，C1-6线性或支链烷基或C5-6环烷基基团，R'和R"分别是氢原子，卤素原子，C1-8烷基或烷氧基团，羟基，碳酸酯基或苯基，m，n，p和q是整数，其中m和q不为零，n和p中至少有一个不为零，0.4≤m/(m+n+p+q)≤0.9，0≤n/(m+n+p+q)≤0.5，0≤p/(m+n+p+q)≤0.5，0.01≤q/(m+n+p+q)≤0.3。
• Resist composition
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20030039920A1

  公开（公告）日：2003-02-27

  This invention relates to a polymer capable of forming an ultra-fine pattern with excellent rectangular shape in a silylated surface resolution process using a chemically amplified type resist composition as single layer or the most upper layer among multiple layers and to a resist composition using the polymer. The said polymer and resist composition are useful in a silylated surface resolution process, and by conducting the silylated surface resolution process using the said resist composition, contrast of silylation becomes higher and it becomes possible to obtain ultra-fine pattern regardless of the kind of exposure energy.

  本发明涉及一种聚合物，能够在使用化学增感型抗蚀剂组成的单层或多层中的最上层作为硅化表面分辨率过程中形成具有优异矩形形状的超细图案，并涉及使用该聚合物的抗蚀剂组成物。该聚合物和抗蚀剂组成物在硅化表面分辨率过程中非常有用，通过使用该抗蚀剂组成物进行硅化表面分辨率过程，硅化对比度更高，无论曝光能量的种类如何，都可以获得超细图案。