diphenyl-iodonium ; hydroxide | 2217-78-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: diphenyl-iodonium ; hydroxide
• 英文别名: Diphenyl-jodonium; Hydroxid；Diphenyliodanium;hydroxide
• CAS: 2217-78-9
• 化学式: C₁₂H₁₀I*HO
• 分子量: 298.123
• InChiKey: UEQLWHWHNVZWAF-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -0.36
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  diphenyl-iodonium ; hydroxide 、 N-hydroxy-2,2-dimethylsuccinimide sodium salt 以 乙醇 为溶剂， 生成 3,3-Dimethyl-1-phenoxy-pyrrolidine-2,5-dione
  参考文献：
  名称：

  取代的O-芳基-羟胺中的旋转障碍。

  摘要：

  研究了取代基对O-芳基羟胺中旋转屏障的影响。结果不支持类似物次磺酰胺系列中任何提议的取代基作用机理。

  DOI：

  10.1016/s0040-4039(00)78840-x
• 作为产物：
  描述：

  碘苯 在 barium dihydroxide 作用下， 生成 diphenyl-iodonium ; hydroxide
  参考文献：
  名称：

  Willgerodt, Chemische Berichte, 1896, vol. 29, p. 2009

  摘要：

  DOI：

文献信息

• Photoresist composition for deep ultraviolet lithography
  申请人：——

  公开号：US20020187419A1

  公开（公告）日：2002-12-12

  The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region and a method of processing the novel photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a solvent. The novel copolymer comprises a unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and a unit derived from an unsaturated cyclic non aromatic compound.

  本发明涉及一种新型的光阻组合物，对深紫外区域敏感，并提供一种处理新型光阻的方法，其中光阻包括一种新型共聚物、一种光活性组分和一种溶剂。所述新型共聚物包括从至少含有一个氰基官能团的乙烯基不饱和化合物和一个不饱和环状非芳香化合物中导出的单元。
• NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS
  申请人：——

  公开号：US20030013831A1

  公开（公告）日：2003-01-16

  The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.

  本发明涉及一种新型聚合物，包括至少一个由含有至少一个氰基功能和至少一个非芳香环状单元的乙烯基不饱和化合物导出的单元。当用于深紫外区域敏感的光阻组合物时，该新型聚合物特别有用。
• COMPOUND
  申请人：Sumitomo Chemical Company, Limited

  公开号：US20220144769A1

  公开（公告）日：2022-05-12

  A compound represented by Formula (I) is provided: In Formula (I), R 3 , R 4 , and R 5 each independently represent an electron-withdrawing group; R 1 , R 2 , R 6 , and R 7 each independently represent a hydrogen atom, a heterocyclic group, a halogen atom, a nitro group, a cyano group, a hydroxy group, a thiol group, a carboxy group, —SCF 3 , —SF 5 , —SF 3 , —SO 3 H, —SO 2 H, an aliphatic hydrocarbon group having 1 to 25 carbon atoms which may have a substituent, or an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent; and R 1 and R 2 , R 1 and R 6 , R 6 and R 7 , and R 4 and R 5 may be linked to each other to form a ring.

  提供一个由公式（I）表示的化合物： 在公式（I）中，R3，R4和R5分别代表一个电子吸引基团；R1，R2，R6和R7分别代表氢原子，杂环基团，卤素原子，硝基，氰基，羟基，硫醇基，羧基，-SCF3，-SF5，-SF3，-SO3H，-SO2H，具有1至25个碳原子的脂肪烃基团，可能具有取代基，或具有6至18个碳原子的芳香烃基团，可能具有取代基；R1和R2，R1和R6，R6和R7以及R4和R5可以相互连接形成环。
• NOVEL PROCESS FOR PREPARING RESISTS
  申请人：Clariant International Ltd.

  公开号：EP0942329A1

  公开（公告）日：1999-09-15

  A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

  在酸催化剂存在下，将具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物在非沸腾溶剂（如丙二醇单甲醚醋酸酯）中反应，通过添加碱使反应暂停，并直接向反应溶液中添加光酸发生器，从而制备抗蚀剂组合物。当使用二烷基二碳酸酯代替乙烯基醚化合物时，在碱性催化剂存在下进行反应，并在反应中直接加入光酸发生器，即可制备抗蚀剂组合物。因此，在制备抗蚀剂组合物时，无需分离或提纯已被催化反应取代的碱溶性聚合物。
• Processes for preparing photoresist compositions
  申请人：E.I. DUPONT DE NEMOURS AND COMPANY

  公开号：EP1479700A1

  公开（公告）日：2004-11-24

  An anhydrous, liquid phase process for preparing polymers of enhanced purity and low polydispersity comprising the steps of polymerization, optional purification, transesterification, optional purification, catalyst removal, and solvent exchange. The resultant polymer in solution can be used directly, without further processing steps, to prepare a photoresist composition.

  一种用于制备纯度更高、多分散性更低的聚合物的无水液相工艺，包括聚合、可选提纯、酯交换、可选提纯、去除催化剂和溶剂交换等步骤。所得溶液聚合物可直接用于制备光刻胶组合物，无需进一步加工步骤。