2-thienylsulfonyl-trifluoromethanesulfonyl-diazomethane | 356058-60-1

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 杂芳族化合物
• 英文名称: 2-thienylsulfonyl-trifluoromethanesulfonyl-diazomethane
• 英文别名: 2-[(Z)-diazo(trifluoromethylsulfonyl)methyl]sulfonylthiophene
• CAS: 356058-60-1
• 化学式: C₆H₃F₃N₂O₄S₃
• 分子量: 320.294
• InChiKey: YLQHEUWEVHPDJC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  115
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• Photoacid generators and photoresists comprising same
  申请人：Shipley Company, L.L.C.

  公开号：US20020009663A1

  公开（公告）日：2002-01-24

  New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, non-ionic substituted disulfone compounds PAGS are provided, including disulfone PAGs that contain a diazo, substituted methylene or hydrazine moiety interposed between substituted sulfone groups. Also provided are positive- and negative-acting chemically amplified resists that contain such PAGs and that are preferably imaged with sub-300 nm or sub-200 nm radiation such as 248 nm, 193 nm, or 157 nm radiation.

  提供了新的光酸发生剂化合物（“PAGs”），以及包含这些化合物的光刻胶组合物。具体提供了非离子取代二砜化合物PAGS，包括含有二硫代磺酰基团之间的重氮基团、取代亚甲基或肼基团的二砜PAGs。还提供了包含这些PAGs的正向和负向化学增感光刻胶，最好使用小于300纳米或小于200纳米的辐射进行成像，例如248纳米、193纳米或157纳米辐射。
• US6783912B2
  申请人：——

  公开号：US6783912B2

  公开（公告）日：2004-08-31
• [EN] PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME<br/>[FR] GENERATEURS D'ACIDES PHOTOSENSIBLES ET PHOTORESISTS COMPRENANT CES DERNIERS
  申请人：SHIPLEY CO LLC

  公开号：WO2001063363A2

  公开（公告）日：2001-08-30

  New photoacid generator compounds ('PAGs') are provided and photoresist compositions that comprise such compounds. In particular, non-ionic substituted disulfone compounds PAGS are provided, including disulfone PAGs that contain a diazo, substituted methylene or hydrazine moiety interposed between substituted sulfone groups. Also provided are positive- and negative-acting chemically amplified resists that contain such PAGs and that are preferably imaged with sub-300 nm or sub-200 nm radiation such as 248 nm, 193 nm, or 157 nm radiation.