2-Ethyl-4-isopropyl-pyrrolidin | 91425-77-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯烷类
• 英文名称: 2-Ethyl-4-isopropyl-pyrrolidin
• 英文别名: 2-Ethyl-4-i-propylpyrrolidine；2-ethyl-4-propan-2-ylpyrrolidine
• CAS: 91425-77-3
• 化学式: C₉H₁₉N
• mdl: MFCD19221906
• 分子量: 141.257
• InChiKey: CQMUWHFRONBDHO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• Inhibitors of cyclin-dependent kinase 7 (CDK7)
  申请人：SYROS PHARMACEUTICALS, INC.

  公开号：US10336760B2

  公开（公告）日：2019-07-02

  The present invention provides novel compounds described herein, such as of Formula (I), and pharmaceutically acceptable salts, solvates, hydrates, tautomers, stereoisomers, isotopically labeled derivatives, and compositions thereof. Also provided are methods and kits involving the compounds or compositions for treating or preventing proliferative diseases (e.g., cancers (e.g., leukemia, melanoma, multiple myeloma), benign neoplasms, angiogenesis, inflammatory diseases, autoinflammatory diseases, and autoimmune diseases) in a subject. Treatment of a subject with a proliferative disease using a compound or composition of the invention may inhibit the aberrant activity of cyclin-dependent kinase 7 (CDK7), and therefore, induce cellular apoptosis and/or inhibit transcription in the subject.

  本发明提供了本文所述的新型化合物，如式（I）化合物，及其药学上可接受的盐、溶液剂、水合物、同系物、立体异构体、同位素标记的衍生物和组合物。还提供了涉及这些化合物或组合物的方法和试剂盒，用于治疗或预防受试者的增殖性疾病（如癌症（如白血病、黑色素瘤、多发性骨髓瘤）、良性肿瘤、血管生成、炎症性疾病、自身炎症性疾病和自身免疫性疾病）。使用本发明的化合物或组合物治疗患有增殖性疾病的受试者，可抑制细胞周期蛋白依赖性激酶7（CDK7）的异常活性，从而诱导细胞凋亡和/或抑制受试者体内的转录。
• Antimicrobial Compounds And Methods Of Making And Using The Same
  申请人：Melinta Therapeutics, Inc.

  公开号：US20180065966A1

  公开（公告）日：2018-03-08

  The present disclosure relates generally to the field of antimicrobial compounds and to methods of making and using them. These compounds are useful for treating, preventing, reducing the risk of, and delaying the onset of microbial infections in humans and animals.
• [EN] HAFNIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION<br/>[FR] PRÉCURSEURS CONTENANT DU HAFNIUM POUR UN DÉPÔT EN PHASE VAPEUR
  申请人：AIR LIQUIDE

  公开号：WO2013177284A1

  公开（公告）日：2013-11-28

  Disclosed are hafnium-containing precursors and methods of synthesizing the same. The precursors may be used to deposit hafnium oxide, hafnium silicon oxide and hafnium-metal oxide containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.
• [EN] TITANIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION<br/>[FR] PRÉCURSEURS CONTENANT DU TITANE POUR UN DÉPÔT EN PHASE VAPEUR
  申请人：AIR LIQUIDE

  公开号：WO2013177292A1

  公开（公告）日：2013-11-28

  Disclosed are titanium-containing precursors and methods of synthesizing the same. The precursors may be used to deposit titanium oxide, titanium silicon oxide and titanium-metal oxide containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.
• [EN] ZIRCONIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION<br/>[FR] PRÉCURSEURS CONTENANT DU ZIRCONIUM POUR LE DÉPÔT EN PHASE VAPEUR
  申请人：AIR LIQUIDE

  公开号：WO2013177269A2

  公开（公告）日：2013-11-28

  Disclosed are zirconium-containing precursors and methods of synthesizing the same. The precursors may be used to deposit zirconium oxide, zirconium silicon oxide and zirconium-metal oxide containing layers using vapor deposition methods such as chemical vapor deposition or atomic layer deposition.