A positive-type radiation-sensitive resin composition is provided. The composition includes:
(A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group;
(B) a radiation-sensitive acid generator; and
(C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist.
                            提供了一种正型辐射敏感
树脂组合物。该组合物包括
(A) 一种低分子化合物,该化合物含有至少一个
氨基,
氨基上有一个或两个氢原子与氮原子结合;
氨基上的至少一个氢原子被一个叔丁氧羰基取代;
(B) 辐射敏感酸发生器;以及
(C) 含
硅原子的
树脂,该
树脂由碱不溶性或碱微溶性
树脂组成,并用酸可裂解基团保护;该
树脂在酸可裂解基团裂解后可溶于碱。这种辐射敏感
树脂组合物能有效地对各种类型的辐射做出反应,具有极高的灵敏度和分辨率,以及极佳的长期储存稳定性,可用作正型
化学放大抗蚀剂。