Provided are: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is thus useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which include the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by the following Formula (I):
(wherein, R1 to R10 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, an alkyl group having 1 to 18 carbon atoms which is optionally substituted, or the like; R11 to R15 each independently represent a hydrogen atom, an alkoxy group having 1 to 18 carbon atoms which is optionally substituted, or the like; at least one of R11 to R15 is not a hydrogen atom; and X1- represents a monovalent organic sulfonate anion).
本发明提供了:一种芳香族锍盐化合物,该化合物对基底的腐蚀性低,具有优异的光刻特性,因此可用作光酸发生剂和阳离子聚合剂;以及一种光酸发生剂、一种抗蚀剂组合物、一种阳离子聚合
引发剂和一种阳离子可聚合剂组合物,其中包括该芳香族锍盐化合物。芳香族锍盐化合物由下式(I)表示:
(其中,R1 至 R10 各自独立地代表氢原子、卤素原子、羟基、硝基、
氰基、具有 1 至 18 个碳原子且被任选取代的烷基或类似基团;R11 至 R15 各自独立地代表氢原子、具有 1 至 18 个碳原子且被任选取代的烷氧基或类似基团;R11 至 R15 中至少有一个不是氢原子;以及 X1- 代表一价有机
磺酸盐阴离子)。