Described herein is the first clear evidence of the photochemical generation of tetramethyldisilene which can be efficiently trapped by dienes. An intriguing 1,2-photo-induced silyl migration is also reported.
9,10-Dicyanoanth racene-sen sitized irradiation of 7,8-di silabicyclo[2.2.2]octa-2,5-dienes 1 – 3 in the presence of MeOH resulted in the formation of dimethoxydisilanes and the corresponding aromatic compounds. A stepwise mechanism involving CSi bond cleavage by MeOH is proposed.
7,7,8,8-Tetramethyl-7,8-disilabicyclo[2.2.2]octa-2,5-diene 1, prepared by the high-pressure reaction (10 000 bar) of 1,1,2,2-tetramethyl-1,2-disilacyclohexa-3,5-diene and phenyl vinyl sulphoxide followed by elimination of benzenesulphenic acid, gave tetramethyldisilene (Me2SiSiMe2) upon photolysis which underwent a photochemical [2 + 4] reaction with benzene at 10 K in an argon matrix to regenerate
通过1,1,2,2-的高压反应(10,000 bar)制备的7,7,8,8-四甲基-7,8-二硅双环[2.2.2] octa-2,5-二烯1四甲基1,2,2-二硅环己基-3,5-二烯和苯基乙烯基亚砜,然后消除苯磺酸,经光解后得到四甲基二ilene(Me 2 Si SiMe 2),在10 K下与苯发生光化学[2 + 4]反应在氩气基质中再生前驱体。
Reactions of 7,8-disilabicyclo[2.2.2]octa-2,5-dienes. Evidence for the transient existence of a disilene
作者:D. N. Roark、G. J. D. Peddle
DOI:10.1021/ja00771a049
日期:1972.8
NAKADAIRA YASUHIRO; KOBAYASHI TOSHIAKI; OTSUKA TATSUO; SAKURAI HIDEKI, J. AMER. CHEM. SOC., 1979, 101, NO 2, 486-487