1,1'-(propane-1,3-diyl)bis(3-(3,5-bis(trifluoromethyl)phenyl)thiourea) | 1203579-80-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1'-(propane-1,3-diyl)bis(3-(3,5-bis(trifluoromethyl)phenyl)thiourea)
• 英文别名: 1-[3,5-Bis(trifluoromethyl)phenyl]-3-(3-{3-[3,5-bis(trifluoromethyl)phenyl]thioureido}propyl)thiourea；1-[3,5-bis(trifluoromethyl)phenyl]-3-[3-[[3,5-bis(trifluoromethyl)phenyl]carbamothioylamino]propyl]thiourea
• CAS: 1203579-80-9
• 化学式: C₂₁H₁₆F₁₂N₄S₂
• 分子量: 616.498
• InChiKey: FQQGQKBIVAKKEK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.7
• 重原子数：
  39
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  112
• 氢给体数：
  4
• 氢受体数：
  14

文献信息

• BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS
  申请人：International Business Machines Corporation

  公开号：US20170114246A1

  公开（公告）日：2017-04-27

  Block copolymers (BCPs) for self-assembly applications comprise a linear fluorinated linking group L′ joining a pair of adjacent blocks. A film layer comprising a BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented domain pattern when the underlayer is preferentially wetted by one domain of an otherwise identical self-assembled BCP in which all fluorines of L′ are replaced by hydrogen. The BCP can be a low-chi or high-chi BCP. In a preferred embodiment, the BCP comprises a styrene-based first block, and a second block comprises a carbonate and/or ester repeat unit formed by ring opening polymerization of a cyclic carbonate and/or cyclic ester monomer. The linking group L′ has a lower surface energy than each of the polymer blocks.
• THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK COPOLYMERS
  申请人：International Business Machines Corporation

  公开号：US20170233532A1

  公开（公告）日：2017-08-17

  A high-chi diblock copolymer (BCP) for self-assembly comprises a first block comprising repeat units of trimethylsilyl styrene (TMSS) and styrene, and a second block comprising an aliphatic carbonate repeat unit. The blocks are linked together by a fluorinated junction group L′ in which none of the fluorines of L′ are covalently bound to an atomic center of the polymer backbone. A top-coat free film layer comprising the BCP, which is disposed on an underlayer and in contact with an atmosphere, is capable of forming a perpendicularly oriented lamellar domain pattern on an underlayer that is preferential or non-preferential to the domains of the block copolymer. The domain pattern can be selectively etched to provide a relief pattern comprising a remaining domain. The relief pattern having good critical dimensional uniformity compared to an otherwise identical polymer lacking the silicon.
• HIGH-CHI BLOCK COPOLYMERS FOR INTERCONNECT STRUCTURES BY DIRECTED SELF-ASSEMBLY
  申请人：International Business Machines Corporation

  公开号：US20170294341A1

  公开（公告）日：2017-10-12

  High-chi diblock copolymers are disclosed whose self-assembly properties are suitable for forming hole and bar openings for conductive interconnects in a multi-layered structure. The hole and bar openings have reduced critical dimension, improved uniformity, and improved placement error compared to the industry standard poly(styrene)-b-poly(methyl methacrylate) block copolymer (PS-b-PMMA). The BCPs comprise a poly(styrene) block, which can optionally include repeat units derived from trimethylsilyl styrene, and a second block that can be a polycarbonate block or a polyester block. Block copolymers comprising a fluorinated linking group L′ comprising 1-25 fluorines between the blocks can provide further improvement in uniformity of the openings.
• US9768059B1
  申请人：——

  公开号：US9768059B1

  公开（公告）日：2017-09-19
• US9879152B2
  申请人：——

  公开号：US9879152B2

  公开（公告）日：2018-01-30