ALKYLENE OXIDE POLYMERIZATION USING ALUMINUM COMPOUNDS AND PHOSPHORUS-NITROGEN BASES
申请人:Dow Global Technologies LLC
公开号:EP4097169A1
公开(公告)日:2022-12-07
RESIST COMPOSITION AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:US20210080828A1
公开(公告)日:2021-03-18
A resist composition comprising a base polymer and a salt is provided. The salt consisting of an anion derived from an iodized or brominated phenol and a cation derived from a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene compound. The resist composition exerts a high sensitizing effect and an acid diffusion suppressing effect, causes no film thickness loss after development, and is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
US9958776B2
申请人:——
公开号:US9958776B2
公开(公告)日:2018-05-01
[EN] ALKYLENE OXIDE POLYMERIZATION USING ALUMINUM COMPOUNDS AND PHOSPHORUS-NITROGEN BASES<br/>[FR] POLYMÉRISATION D'OXYDE D'ALKYLÈNE À L'AIDE DE COMPOSÉS D'ALUMINIUM ET DE BASES PHOSPHORE-AZOTE
申请人:DOW GLOBAL TECHNOLOGIES LLC
公开号:WO2021154783A1
公开(公告)日:2021-08-05
Polyethers are prepared by polymerizing an alkylene oxide in the presence of a starter, an aluminum compound that has at least one hydrocarbyl substituent, and a phosphorus-nitrogen base. The phosphorus-nitrogen base is present in only a small molar ratio relative to the amount of starter. The presence of such small amounts of phosphorus-nitrogen base greatly increases the catalytic activity of the system, compared to the case in which the aluminum compound is used by itself. The product polyethers have low amounts of unsaturated polyether impurities and little or no unwanted high molecular weight fraction. Polymers of propylene oxide have very low proportions of primary hydroxyl groups.