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3-Methyl-4-acetoxystyrol | 18625-81-5

中文名称
——
中文别名
——
英文名称
3-Methyl-4-acetoxystyrol
英文别名
2-Methyl-4-vinylphenyl acetate;(4-ethenyl-2-methylphenyl) acetate
3-Methyl-4-acetoxystyrol化学式
CAS
18625-81-5
化学式
C11H12O2
mdl
——
分子量
176.215
InChiKey
KWTNHNLZKCUWCF-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    2.8
  • 重原子数:
    13
  • 可旋转键数:
    3
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.18
  • 拓扑面积:
    26.3
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • Synthesis of 4-acetoxystyrene oxide and related compounds
    申请人:HOECHST CELANESE CORPORATION
    公开号:EP0356070A1
    公开(公告)日:1990-02-28
    A method is provided of producing 4-acetoxystyrene oxide and substituted 4-acetoxystyrene oxides wherein at least one of the ring hydrogen atoms is substituted with a C₁ to C₁₀ alkyl or alkoxy, amino, halogen or nitro, wherein 4-acetoxystyrene or the corresponding substituted 4-acetoxystyrene is epoxided with peracetic acid containing no more than a trace of a mineral acid or water. The invention also includes, as new compositions of matter, 3,5-dimethyl-4-acetoxystyrene oxide and 3,5-dibromo-4-acetoxystyrene oxide.
    本发明提供了制备4-乙酰氧基苯乙烯环氧化物和取代的4-乙酰氧基苯乙烯环氧化物的方法,其中环上至少一个氢原子被C₁到C₁₀烷基或烷氧基、基、卤素或硝基所取代,其中4-乙酰氧基苯乙烯或相应的取代的4-乙酰氧基苯乙烯使用含有微量无机酸过醋酸进行环氧化。本发明还包括新的物质组成,即3,5-二甲基-4-乙酰氧基苯乙烯环氧化物和3,5-二-4-乙酰氧基苯乙烯环氧化物
  • Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use
    申请人:HOECHST AKTIENGESELLSCHAFT
    公开号:EP0307752A2
    公开(公告)日:1989-03-22
    The invention provides poly(3-mono- and 3,5-disubstituted-4-acetoxy- and 4-hydroxystyrenes) and copolymers therefrom having a molecular weight in the range of from about 1,000 to about 800,000 wherein said 3-mono and 3,5-substitution is independently C₁ to C₁₀ alkyl or alkoxy, primary or secondary amino, halogen (Br, Cl, I), NO₂ or SO₃H. The polymers are used as a binder resin in photosensi­tive compositions, wherein the light-sensitive compound is an o-quinone diazide or as an acid-forming radiation-sensitive compound in combination with a com­pound cleavable by acid.
    本发明提供分子量在约 1,000 至约 800,000 范围内的聚(3-单取代和 3,5- 二取代-4-乙酰氧基和 4-羟基苯乙烯)及其共聚物,其中所述 3-单取代和 3,5- 二取代独立地为 C₁ 至 C₁₀ 烷基或烷氧基、伯基或仲基、卤素(Br、Cl、I)、NO₂ 或 SO₃H。 这些聚合物可用作光敏组合物中的粘合剂树脂,其中的光敏化合物是邻醌重氮化物,或与可被酸裂解的化合物结合用作成酸辐射敏感化合物。
  • 3-mono- and 3,5-disubstituted-4-acetoxy and -4-hydroxystyrenes and process for their production
    申请人:HOECHST AKTIENGESELLSCHAFT
    公开号:EP0307751A2
    公开(公告)日:1989-03-22
    The invention relates to 3-mono- and 3,5-disubstituted-4-acetoxy- and -4-hydroxystyrenes, wherein said substitutes are independently C₁ and C₁₀ alkyl, C₁-C₁₀) alkoxy, amino, or halogen, (Br, I, Cl), NO₂ or SO₃H, The compounds of this invention find use as intermediates of polymers, which are useful as improved binder resins for photoresists. In particular those polymers, having as substitutes at least one halogen, are useful as radiation-sensitive compounds in corresponding photoresists. Thus, the invention further relates to a process for production of said styrene derivatives.
    本发明涉及 3-单-和 3,5-二取代-4-乙酰氧基-和-4-羟基苯乙烯,其中所述取代基独立地为 C₁ 和 C₁₀ 烷基、C₁-C₁₀烷氧基、基或卤素(Br、I、Cl)、NO₂ 或 SO₃H、本发明的化合物可用作聚合物的中间体,这些聚合物可用作光刻胶的改良粘结树脂。 特别是那些至少有一种卤素作为替代物的聚合物,在相应的光刻胶中可用作辐射敏感化合物。 因此,本发明还涉及一种生产上述苯乙烯生物的工艺。
  • A process for the production of poly(3-mono or 3,5-disubstituted-4-Acetoxystryrenes), their copolymers and hydrolysis thereof
    申请人:HOECHST AKTIENGESELLSCHAFT
    公开号:EP0353339A2
    公开(公告)日:1990-02-07
    The present invention relates to a process for the production of poly(3-mono or 3,5-disubstituted-4-acetoxy- or -4-hydroxystyrenes) wherein the 3- or 3,5-substitution is independently (C₁-C₁₀)alkyl, (C₁-C₁₀)alkoxy, chlorine, bromine, iodi­ne, amine, -NO₂, or -SO₃H, a process for production of their copolymers and their hydrolysis.
    本发明涉及一种生产聚(3-单取代或 3,5-二取代-4-乙酰氧基-或-4-羟基苯乙烯)的工艺,其中 3-或 3、5-取代基独立地为(C₁-C₁₀)烷基、(C₁-C₁₀)烷氧基、、胺、-NO₂或-SO₃H,以及生产它们的共聚物和解它们的工艺。
  • Process for making low optical density polymers and copolymers for photoresists and optical applications
    申请人:HOECHST CELANESE CORPORATION
    公开号:EP0466359A2
    公开(公告)日:1992-01-15
    Polymers comprising poly(4-hydroxystyrene) and/or substituted poly(4-hydroxystyrene) are produced by polymerizing 4-acetoxystyrene and/or substituted 4-acetoxystyrene monomers, with or without other comonomers, and subsequently performing transesterification. Preferably, the polymers are produced using at least one alcohol as a reaction medium, a chain transfer agent and a transesterification reactant. It is appropriate: to use an initiator which does not comprise a substantially absorbant structure over the 240 to 260 nm range or to use an initiator concentration of less than about 3 mole % of the monomer(s); to obtain a polymerization conversion of the initial polymerization monomers of at least about 90% by weight, or to remove residual monomer(s) from the reaction medium prior to transesterification; to obtain a transesterification conversion of the polymerized monomers of at least 85% by weight; and to avoid the use of transesterification catalysts which can cause the formation of chemical structures which can absorb over the 240 to 260 nm radiation wavelength range. The target polymers have low optical density (absorbance) over a wavelength range from 240 to 260 nm, as well as low optical density over the near UV and visible spectrum (310 to 800 nm); and are useful as photoresist components for use in combination with deep UV, X-ray, and E-Beam imaging systems.
    由聚(4-羟基苯乙烯)和/或取代聚(4-羟基苯乙烯)组成的聚合物是通过聚合 4-乙酰氧基苯乙烯和/或取代的 4-乙酰氧基苯乙烯单体(可使用或不使用其他共聚单体),然后进行酯交换反应制得的。最好使用至少一种醇作为反应介质、链转移剂和酯交换反应物来生产聚合物。最好使用的引发剂在 240 至 260 纳米范围内不具有吸光结构,或引发剂浓度小于单体的约 3 摩尔%;初始聚合单体的聚合转化率至少达到约 90%(按重量计),或在酯交换反应之前从反应介质中去除残余单体;使聚合单体的酯交换转化率至少达到 85%(按重量计);以及避免使用可导致形成化学结构的酯交换催化剂,这种化学结构可吸收 240 至 260 纳米波长范围内的辐射。目标聚合物在 240 至 260 纳米的波长范围内具有较低的光密度(吸光度),在近紫外和可见光谱(310 至 800 纳米)范围内也具有较低的光密度;可用作光致抗蚀剂成分,与深紫外、X 射线和电子束成像系统结合使用。
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