The present invention involves photoprotective compositions which are useful for topical application to prevent damage to skin caused by acute or chronic exposure to ultraviolet light comprising chelating agents having the formula ##STR1## wherein --R.sup.1 and --R.sup.2 are independently selected from the group consisting of alkyl, aryl, and heteroaryl, or R.sup.1 and R.sup.2 may be covalently bonded together to form a cyclic alkyl; --M is selected from the group consisting of =0, =S, --SR.sup.4 and --OR.sup.4 (when --M is --OR.sup.4 or --SR.sup.4, there is a hydrogen bonded to the carbon to which --M is bonded); --R.sup.4 is selected from the group consisting of hydrogen, alkyl, aryl and heteroaryl; --R.sup.3 is selected from the group consisting of hydrogen, alkyl, aryl and heteroaryl; --R.sup.6 is selected from the group consisting of hydrogen alkyl, aryl and heteroaryl; and i is selected from the group consisting of one and zero. Methods for using such compositions to prevent damage to skin caused by acute or chronic exposure to ultraviolet light are al so involved.
本发明涉及光保护组合物,适用于局部应用以预防由急性或慢性暴露于紫外线光引起的皮肤损伤,其包括具有以下结构的
螯合剂:其中--R.sup.1和--R.sup.2分别来自于由烷基、芳基和杂环烷基组成的群,或者R.sup.1和R.sup.2可以共价结合在一起形成一个环状烷基;--M来自于由=0、=S、--SR.sup.4和--OR.sup.4组成的群(当--M为--OR.sup.4或--SR.sup.4时,与--M结合的碳上有氢键);--R.sup.4来自于氢、烷基、芳基和杂环烷基组成的群;--R.sup.3来自于氢、烷基、芳基和杂环烷基组成的群;--R.sup.6来自于氢、烷基、芳基和杂环烷基组成的群;i来自于1和0的群。还涉及使用这类组合物的方法,以预防由急性或慢性暴露于紫外线光引起的皮肤损伤。