methyl 9,10-dimethoxyanthracene-2-sulfonate | 342809-26-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: methyl 9,10-dimethoxyanthracene-2-sulfonate
• CAS: 342809-26-1
• 化学式: C₁₇H₁₆O₅S
• 分子量: 332.377
• InChiKey: WVZHFJHADLSWSO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  23
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  70.2
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  methyl 9,10-dimethoxyanthracene-2-sulfonate 、 bis(4-tert-butylphenyl)iodonium chloride 以 乙腈 为溶剂， 以78%的产率得到bis(p-tert-butylphenyl)iodonium 9,10-dimethoxyanthracene-2-sulfonate
  参考文献：
  名称：

  Process for producing onium salt derivative and novel onium salt derivative

  摘要：

  该发明提供了一种高产率的方法，用于生产盐衍生物，这些盐衍生物可用作在化学增强型光刻胶中使用的代理，例如酸发生剂；并提供了新颖的盐衍生物。含有卤根离子或羧酸根离子的盐衍生物与磺酸酯衍生物或磷酸衍生物的反应在高产率下提供盐硫酸盐衍生物或盐磷酸盐衍生物。

  公开号：

  US06620957B1

文献信息

• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• Method for producing onium salt derivatives, and novel onium salt derivatives
  申请人：Tomita Kyoichi

  公开号：US20050176982A1

  公开（公告）日：2005-08-11

  The invention provides a high-yield method for producing onium salt derivatives useful as agents, such as acid-generators, employed in chemically amplified resists; and to provide novel onium salt derivatives. Reaction of an onium salt derivative containing a halide anion or a carboxylate anion with a sulfonic acid ester derivative or a phosphoric acid derivative provides an onium sulfate derivative or an onium phosphate derivative at high yield.

  本发明提供了一种高产率的方法，用于生产有用于代理的酸发生剂，如化学增强型光刻胶中所用的离子盐衍生物；并提供新的离子盐衍生物。将含有卤素阴离子或羧酸盐离子的离子盐衍生物与磺酸酯衍生物或磷酸衍生物反应，可高产率地得到离子硫酸盐衍生物或离子磷酸盐衍生物。
• PROCESS FOR PRODUCING ONIUM SALT DERIVATIVE AND NOVEL ONIUM SALT DERIVATIVE
  申请人：Toyo Gosei Kogyo Co., Ltd.

  公开号：EP1164127A1

  公开（公告）日：2001-12-19

  The invention provides a high-yield method for producing onium salt derivatives useful as agents, such as acid-generators, employed in chemically amplified resists; and to provide novel onium salt derivatives. Reaction of an onium salt derivative containing a halide anion or a carboxylate anion with a sulfonic acid ester derivative or a phosphoric acid derivative provides an onium sulfate derivative or an onium phosphate derivative at high yield.

  本发明提供了一种生产鎓盐衍生物的高产方法，该衍生物可用作化学放大抗蚀剂中使用的制剂（如酸生成剂）；本发明还提供了新型鎓盐衍生物。将含有卤化阴离子或羧酸阴离子的鎓盐衍生物与磺酸酯衍生物或磷酸衍生物反应，可获得高产率的硫酸鎓衍生物或磷酸鎓衍生物。
• NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：EP2725423A1

  公开（公告）日：2014-04-30

  Provided are: a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the negative-type photosensitive resin composition; a cured film, an insulating film, and a color filter formed using the negative-type photosensitive resin composition; and a display device provided with the cured film, insulating film, or color filter. The negative-type photosensitive resin composition according to the present invention contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.

  本发明提供了：一种负型感光树脂组合物，该组合物能够在低光曝光下形成具有良好粘合性的图案；一种使用该负型感光树脂组合物的图案形成方法；一种使用该负型感光树脂组合物形成的固化薄膜、绝缘薄膜和彩色滤光片；以及一种装有该固化薄膜、绝缘薄膜或彩色滤光片的显示装置。根据本发明的负型感光树脂组合物含有下式（1）表示的化合物。式中，R1 和 R2 各自独立地表示氢原子或有机基团，但至少有一个表示有机基团。R1 和 R2 可以键合形成环状结构，也可以含有杂原子键。R3 表示单键或有机基团。R4 至 R9 各自独立地表示氢原子、有机基团等，但 R6 和 R7 绝不是羟基。R10 表示氢原子或有机基团。
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST LAMINATE, AND ARTICLES OBTAINED BY CURING SAME (7)
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：EP2924504A1

  公开（公告）日：2015-09-30

  The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyhydric phenol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). The reactive epoxy monomer (E) is a bisphenol epoxy resin.

  本发明的目的是提供以下内容：一种光敏环氧树脂组合物，该组合物通过光刻技术可形成高分辨率、低应力的图像，该图像具有垂直侧壁并可防潮防热，和/或使用所述光敏环氧树脂组合物的抗蚀层压板；以及通过固化所述光敏环氧树脂组合物和/或抗蚀层压板获得的一种或多种物品。本发明是一种光敏树脂组合物，含有以下成分：环氧树脂（A）、具有特定结构的多氢苯酚化合物（B）、阳离子聚合光引发剂（C）、含有环氧基团的硅烷化合物（D）和具有特定结构的活性环氧单体（E）。环氧树脂（A）包含由式（1）表示的苯酚衍生物、通过与表卤醇反应得到的环氧树脂（a）以及可由式（2）表示的环氧树脂（b）。活性环氧单体（E）是双酚环氧树脂。