申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20210286260A1
公开(公告)日:2021-09-16
Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator:
wherein, in formula (I),
R
1
represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms,
m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R
1
may be the same or different from each other.