The invention describes the use of oxime alkyl sulfonate compounds of formula 1
1
R
0
is either an R
1
—X group or R
2
;
X is a direct bond, an oxygen atom or a sulfur atom;
R
1
is hydrogen, C
1
-C
4
alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C
1
-C
4
alkyl and C
1
-C
4
-alkyloxy;
R
2
is hydrogen or C
1
-C
4
alkyl; and
R
3
is straight-chain or branched C
1
-C
12
alkyl which is unsubstituted or substituted by one or more than one halogen atom;
as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
该发明描述了氧
肟烷
磺酸酯化合物的使用,其
化学式为11R0,其中R0是R1—X基团或R2;X是一个直接键,一个氧原子或一个
硫原子;R1是氢,C1-C4烷基或苯基,未取代或取代,取代基选择自
氯、
溴、C1-C4烷基和C1-C4-烷氧基组成的组;R2是氢或C1-C4烷基;R3是直链或支链的C1-C12烷基,未取代或取代,取代一个或多个卤素原子;作为
化学增感光阻剂中的光敏添加剂,该增感光阻剂可在碱性介质中显影,对波长为340至390纳米的辐射敏感,相应地组成了上述波长范围内的正负光刻胶。